Specific Process Knowledge/Lithography/EBeamLithography/RaithElphyManual: Difference between revisions
| Line 3: | Line 3: | ||
= Purpose, location and technical specifications = | = Purpose, location and technical specifications = | ||
The Raith Elphy system is a pattern generator built onto the [[Specific_Process_Knowledge/Characterization/SEM:_Scanning_Electron_Microscopy/Leo|LEO SEM]]. | |||
| Line 14: | Line 15: | ||
*The spot beam for electron beam writing is generated by a ZrO/W emitter and a four-stage electron beam focusing lens system, see illustration below. | *The spot beam for electron beam writing is generated by a ZrO/W emitter and a four-stage electron beam focusing lens system, see illustration below. | ||
= Mounting of chips or wafers into cassette = | = Mounting of chips or wafers into cassette = | ||
Revision as of 12:07, 28 September 2015
Feedback to this page: click here
Purpose, location and technical specifications
The Raith Elphy system is a pattern generator built onto the LEO SEM.
Location
Techical Specification
The system can be characterized as follows:
- The spot beam for electron beam writing is generated by a ZrO/W emitter and a four-stage electron beam focusing lens system, see illustration below.