Specific Process Knowledge/Thin film deposition/Deposition of Nickel: Difference between revisions
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! E-beam evaporation ([[Specific Process Knowledge/Thin film deposition/Multisource PVD|PVD co-sputter/evaporation]]) | ! E-beam evaporation ([[Specific Process Knowledge/Thin film deposition/Multisource PVD|PVD co-sputter/evaporation]]) | ||
! E-beam evaporation ([[Specific Process Knowledge/Thin film deposition/Physimeca|Physimeca]]) | ! E-beam evaporation ([[Specific Process Knowledge/Thin film deposition/Physimeca|Physimeca]]) | ||
! Sputter deposition ([[Specific Process Knowledge/Thin film deposition/Lesker|Lesker]]) | |||
! Electroplating ([[Specific Process Knowledge/Thin film deposition/Electroplating-Ni|Electroplating-Ni]]) | ! Electroplating ([[Specific Process Knowledge/Thin film deposition/Electroplating-Ni|Electroplating-Ni]]) | ||
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|E-beam deposition of Nickel | |E-beam deposition of Nickel | ||
|E-beam deposition of Nickel | |E-beam deposition of Nickel | ||
|Sputter deposition of Nickel | |||
|Electroplating of Nickel | |Electroplating of Nickel | ||
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|RF Ar clean | |RF Ar clean | ||
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|RF Ar clean | |||
|None | |None | ||
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|10Å to 1 µm* | |10Å to 1 µm* | ||
|10Å to 1000 Å | |10Å to 1000 Å | ||
|10Å to 2000 Å | |||
|10Å to 2000 Å | |10Å to 2000 Å | ||
|A few µm to 1400 µm | |A few µm to 1400 µm | ||
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|About 1Å/s | |About 1Å/s | ||
|1 to 10Å/s | |1 to 10Å/s | ||
|Depends on process parameters. About 1 Å/s | |||
|About 10 Å/s to 250 Å/s | |About 10 Å/s to 250 Å/s | ||
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*1x 4" wafers or | *1x 4" wafers or | ||
*Several smaller pieces | *Several smaller pieces | ||
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* Pieces or | |||
* 1x4" wafer or | |||
* 1x6" wafer | |||
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*1x2" wafer or | *1x2" wafer or | ||
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* Mylar | * Mylar | ||
* Silicon | * Silicon | ||
* Silicon oxide | * Silicon oxide | ||
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* Mylar | * Mylar | ||
* SU-8 | * SU-8 | ||
* Metals | |||
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* Silicon | |||
* Silicon oxide | |||
* Silicon (oxy)nitride | |||
* Photoresist | |||
* Metals | * Metals | ||
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*Thicknesses above 2000 Å requires special permission | *Thicknesses above 2000 Å requires special permission | ||
|Only very thin layers (up to 100nm). | |Only very thin layers (up to 100nm). | ||
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|Sample must be compatible with plating bath. Seed metal necessary. | |Sample must be compatible with plating bath. Seed metal necessary. | ||