Specific Process Knowledge/Thin Film deposition/ALD/Al2O3 deposition using ALD: Difference between revisions

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The ALD window for depostion of aluminium oxide ranges from 150 <sup>o</sup>C to 350 <sup>o</sup>C. XPS measurements shows that at temperatures below 150 <sup>o</sup>C the Al<sub>2</sub>O<sub>3</sub> layer will be contaminated by unreacted TMA molecules, and at temperatures above 350 <sup>o</sup>C the TMA decomposes.


The ALD window for depostion of aluminium oxide ranges from 150 <sup>o</sup>C to 350 <sup>o</sup>C. XPS measurements shows that at temperatures below 150 <sup>o</sup>C the Al<sub>2</sub>O<sub>3</sub> will be contaminated by unreacted TMA molecules, and at temperatures above 350 <sup>o</sup>C the TMA decomposes.
All results shown on this page have been obtained using the "AL2O3" recipe:
 
The deposition rate for Al<sub>2</sub>O<sub>3</sub> depends on the temperature, see the graph below. 
 
{| border="1" cellspacing="1" cellpadding="2"
!
[[Image:ALD window Al2O3 H2O.jpg|300x300px|thumb|center|Al<sub>2</sub>O<sub>3</sub> thickness as function of number of cycles, temperature 150 <sup>o</sup>C.]]
|}
 
 
In the graphs below the Al<sub>2</sub>O<sub>3</sub> thickness as function of number of cycles for deposition temperatures between 150 <sup>o</sup>C and 350 <sup>o</sup>C can be seen. From the equations the number of cycles required for a certain thickess can be calculated. The results have been obtained using the "AL2O3" recipe:




Line 39: Line 30:




<gallery caption="Aluminium oxide thickness as function of number of cycles" widths="300px" heights="300px" perrow="3">
The deposition rate for Al<sub>2</sub>O<sub>3</sub> depends on the temperature, see the graph below. 
 
{| border="1" cellspacing="1" cellpadding="2"
!
[[Image:ALD window Al2O3 H2O.jpg|350x350px|thumb|center|Al<sub>2</sub>O<sub>3</sub> deposition rate as function of temperature.]]
|}
 
 
In the graphs below the Al<sub>2</sub>O<sub>3</sub> thickness as function of number of cycles for deposition temperatures between 150 <sup>o</sup>C and 350 <sup>o</sup>C can be seen. From the equations the number of cycles required for a certain thickess can be calculated.
 
<gallery caption="Aluminium oxide thickness as function of number of cycles" widths="220px" heights="220px" perrow="5">
image:ALD Al2O3 grow rate 150C.jpg| Temperature 150 <sup>o</sup>C.
image:ALD Al2O3 grow rate 150C.jpg| Temperature 150 <sup>o</sup>C.
image:ALD Al2O3 grow rate 200C.jpg| Temperature 200 <sup>o</sup>C.
image:ALD Al2O3 grow rate 200C.jpg| Temperature 200 <sup>o</sup>C.

Revision as of 12:30, 27 March 2014

The ALD window for depostion of aluminium oxide ranges from 150 oC to 350 oC. XPS measurements shows that at temperatures below 150 oC the Al2O3 layer will be contaminated by unreacted TMA molecules, and at temperatures above 350 oC the TMA decomposes.

All results shown on this page have been obtained using the "AL2O3" recipe:


Recipe: AL2O3

Temperature: 150 oC - 350 oC

TMA H2O
Nitrogen flow 150 sccm 200 sccm
Pulse time 0.1 s 0.1 s
Purge time 3.0 s 4.0 s


The deposition rate for Al2O3 depends on the temperature, see the graph below.

Al2O3 deposition rate as function of temperature.


In the graphs below the Al2O3 thickness as function of number of cycles for deposition temperatures between 150 oC and 350 oC can be seen. From the equations the number of cycles required for a certain thickess can be calculated.

  • Aluminium oxide thickness as function of number of cycles
  • Temperature 150 oC.
    Temperature 150 oC.
  • Temperature 200 oC.
    Temperature 200 oC.
  • Temperature 250 oC.
    Temperature 250 oC.
  • Temperature 300 oC.
    Temperature 300 oC.
  • Temperature 350 oC.
    Temperature 350 oC.


Evgeniy Shkondin, DTU Danchip, February-March 2014.

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