Specific Process Knowledge/Thin Film deposition/ALD/Al2O3 deposition using ALD: Difference between revisions

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The ALD window for depostion of Al<sub>2</sub>O<sub>3</sub> ranges from 150 <sup>o</sup>C to 350 <sup>o</sup>C. XPS measurements shows that at temperatures below 150 <sup>o</sup>C the Al<sub>2</sub>O<sub>3</sub> will be contaminated by unreacted TMA molecules, and at temperatures above 350 <sup>o</sup>C the TMA decomposes.  
The ALD window for depostion of Al<sub>2</sub>O<sub>3</sub> ranges from 150 <sup>o</sup>C to 350 <sup>o</sup>C. XPS measurements shows that at temperatures below 150 <sup>o</sup>C the Al<sub>2</sub>O<sub>3</sub> will be contaminated by unreacted TMA molecules, and at temperatures above 350 <sup>o</sup>C the TMA decomposes.  


The deposition rate for Al<sub>2</sub>O<sub>3</sub> depends on the temperature  
The deposition rate for Al<sub>2</sub>O<sub>3</sub> depends on the temperature, see the graph below. 


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Below the Al<sub>2</sub>O<sub>3</sub> thickness as function of number of cycles for deposition temperatures between 150 <sup>o</sup>C and 350 <sup>o</sup>C can be seen. From the equations the number of cycles required for a certain thickess can be calculated.  
In the graphs below the Al<sub>2</sub>O<sub>3</sub> thickness as function of number of cycles for deposition temperatures between 150 <sup>o</sup>C and 350 <sup>o</sup>C can be seen. From the equations the number of cycles required for a certain thickess can be calculated. The results have been obtained using the "AL2O3" recipe:
 
<b>Recipe name</b>: AL2O3
 
<b>Temperature</b>: 150 <sup>o</sup>C - 350 <sup>o</sup>C
 
{| border="2" cellspacing="2" cellpadding="5"  align="none"
|-
|
!TMA
!H<sub>2</sub>O
|-
!Nitrogen flow
|150 sccm
|200 sccm
|-
!Pulse time
|0.1 s
|0.1 s
|-
!Purge time
|3.0 s
|4.0 s
|-
|}
 


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All results above have been obtained by Evgeniy Shkondin, DTU Danchip, February-March 2014.
Evgeniy Shkondin, DTU Danchip, February-March 2014.

Revision as of 10:56, 27 March 2014

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The ALD window for depostion of Al2O3 ranges from 150 oC to 350 oC. XPS measurements shows that at temperatures below 150 oC the Al2O3 will be contaminated by unreacted TMA molecules, and at temperatures above 350 oC the TMA decomposes.

The deposition rate for Al2O3 depends on the temperature, see the graph below.

Al2O3 thickness as function of number of cycles, temperature 150 oC.


In the graphs below the Al2O3 thickness as function of number of cycles for deposition temperatures between 150 oC and 350 oC can be seen. From the equations the number of cycles required for a certain thickess can be calculated. The results have been obtained using the "AL2O3" recipe:

Recipe name: AL2O3

Temperature: 150 oC - 350 oC

TMA H2O
Nitrogen flow 150 sccm 200 sccm
Pulse time 0.1 s 0.1 s
Purge time 3.0 s 4.0 s


Al2O3 thickness as function of number of cycles, temperature 150 oC.


Al2O3 thickness as function of number of cycles, temperature 200 oC.


Al2O3 thickness as function of number of cycles, temperature 250 oC.


Al2O3 thickness as function of number of cycles, temperature 300 oC.


Al2O3 thickness as function of number of cycles, temperature 350 oC.


Al2O3 thickness as function of number of cycles, temperature 300 oC.

Evgeniy Shkondin, DTU Danchip, February-March 2014.

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