Specific Process Knowledge/Thin film deposition/Deposition of Silver: Difference between revisions

! Sputter evaporation ([[Specific Process Knowledge/Thin film deposition/Multisource PVD|PVD co-sputter/evaporation]])

! Sputter evaporation ([[Specific Process Knowledge/Thin film deposition/Wordentec|Wordentec]])

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! Layer thickness

|10Å to 0.5µm (0.5µm not on all wafers)

|10Å to 1000Å  

!Allowed materials

|

* Silicon oxide  

* Silicon (oxy)nitride  

|}

[[/Deposition of Silver|Thermal deposition of Silver]] - ''Process settings for thermal deposition of Silver in Wordentec''