Specific Process Knowledge/Thermal Process/Oxidation: Difference between revisions
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|max. 30 wafers of 4" or 2"||max. 30 4" wafers or 2" wafers||max. 30 wafers of 6",4" or 2"||max. 30 4" wafers or 2" wafers||max. 30 4" wafers or 2" wafers||max. 200 4" | |max. 30 wafers of 4" or 2"||max. 30 4" wafers or 2" wafers||max. 30 wafers of 6",4" or 2"||max. 30 4" wafers or 2" wafers||max. 30 4" wafers or 2" wafers||max. 200 4" | ||
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!Which wafers are allowed to enter the furnace: | !style="background:#f0f0f0;"|Which wafers are allowed to enter the furnace: | ||
| align="center" style="background:#f0f0f0;"|'''A1 Boron drive-in''' | | align="center" style="background:#f0f0f0;"|'''A1 Boron drive-in''' | ||
| align="center" style="background:#f0f0f0;"|'''A3 Phosphorous drive-in''' | | align="center" style="background:#f0f0f0;"|'''A3 Phosphorous drive-in''' | ||