Jump to content

Specific Process Knowledge/Etch/Etching of Chromium: Difference between revisions

← Older editNewer edit →
VisualWikitext
BGE (talk | contribs)
Bureaucrats, danchip, Administrators
2,908 edits
BGE (talk | contribs)
Bureaucrats, danchip, Administrators
2,908 edits
Line 2: Line 2:
Etching of chromium is done wet at Danchip. We have two solution for this:
Etching of chromium is done wet at Danchip. We have two solution for this:


# H<math>NO_3</math>:H<math>_2</math>O:cerisulphate  90ml:1200ml:15g
# HNO<math>_3</math>:H<math>_2</math>O:cerisulphate  - 90ml:1200ml:15g
# Commercial chromium etch


Etch rate 400-1000 Å/min (depending on the level of oxidation of the metal)
Etch rate 400-1000 Å/min (depending on the level of oxidation of the metal)
Line 19: Line 20:
|-
|-
|Chemical solution
|Chemical solution
|H<math>_2</math>O:H<math>_3</math>PO<math>_4</math>  1:2
|HNO<math>_3</math>:H<math>_2</math>O:cerisulphate - 90ml:1200ml:15g
|PES 77-19-04
|Commercial chromium etch
|-
|-
|Process temperature
|Process temperature
|50 <sup>o</sup>C
|Room temperature


|20 <sup>o</sup>C
|Room temperature


|-
|-
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Etch/Etching_of_Chromium"