Specific Process Knowledge/Thin film deposition/Wordentec: Difference between revisions
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*[[Specific Process Knowledge/Thin film deposition/Deposition of Titanium|Titanium (Ti)]] | *[[Specific Process Knowledge/Thin film deposition/Deposition of Titanium|Titanium (Ti)]] | ||
== | == Overview of the performance of Wordentec and some process related parameters== | ||
{| border="2" cellspacing="0" cellpadding="10" | {| border="2" cellspacing="0" cellpadding="10" | ||
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!style="background:silver; color:black;" align="left"|Purpose | !style="background:silver; color:black;" align="left"|Purpose | ||
|style="background:LightGrey; color:black"|Deposition of metals||style="background:WhiteSmoke; color:black"| | |style="background:LightGrey; color:black"|Deposition of metals| | ||
|style="background:WhiteSmoke; color:black"| | |||
*E-beam evaporation | *E-beam evaporation | ||
*Sputtering | *Sputtering | ||
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!style="background:silver; color:black" align="left"|Performance | !style="background:silver; color:black" align="left"|Performance | ||
|style="background:LightGrey; color:black"|Film thickness||style="background:WhiteSmoke; color:black"| | |style="background:LightGrey; color:black"|Film thickness| | ||
|style="background:WhiteSmoke; color:black"| | |||
*~10Å - 1µm | *~10Å - 1µm | ||
|- | |- | ||
|style="background:silver; color:black" | | |style="background:silver; color:black" | | ||
|style="background:LightGrey; color:black"|Deposition rate | |||
|style="background:WhiteSmoke; color:black"| | |||
*~2.5Å/s - 15Å/s | *~2.5Å/s - 15Å/s | ||
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*Less than 80 <sup>o</sup>C | *Less than 80 <sup>o</sup>C | ||
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|style="background:silver; color:black"| | |style="background:silver; color:black"| | ||
|style="background:LightGrey; color:black"|Process pressure | |||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
*~3x10<sup>-7</sup> - 4x10<sup>-6</sup> mbar | *~3x10<sup>-7</sup> - 4x10<sup>-6</sup> mbar | ||
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*Deposition on one side of the substrate | *Deposition on one side of the substrate | ||
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|style="background:silver; color:black"| | |style="background:silver; color:black"| | ||
| style="background:LightGrey; color:black"|Substrate material allowed | |||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
*Silicon wafers | *Silicon wafers | ||
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*Pyrex wafers | *Pyrex wafers | ||
|- | |- | ||
|style="background:silver; color:black"| | |style="background:silver; color:black"| | ||
| style="background:LightGrey; color:black"|Material allowed on the substrate | |||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
*Silicon oxide | *Silicon oxide | ||