Specific Process Knowledge/Lithography/UVExposure Dose: Difference between revisions
No edit summary |
Redirected page to Specific Process Knowledge/Lithography/Resist#Exposure dose Tag: New redirect |
||
| (One intermediate revision by the same user not shown) | |||
| Line 1: | Line 1: | ||
#REDIRECT [[Specific Process Knowledge/Lithography/Resist#Exposure_dose]] | |||
| Line 123: | Line 123: | ||
It is important to keep in mind that this exposure time is valid only for a specific combination of exposure source and optical sensor, as well as for a specific development process. | It is important to keep in mind that this exposure time is valid only for a specific combination of exposure source and optical sensor, as well as for a specific development process. | ||
SECTION HIDDEN BY TARAN 20-03-2020 | |||
==Comparison: Relative exposure dose== | ==Comparison: Relative exposure dose== | ||
| Line 174: | Line 174: | ||
<sup>1)</sup> Due to a difference in the sensitivity of the power meter used in calibration. | <sup>1)</sup> Due to a difference in the sensitivity of the power meter used in calibration. | ||
<br clear="all" /> | <br clear="all" /> | ||