Specific Process Knowledge/Thin film deposition/Physimeca/Physimeca calibration

Feedback to this page: click here

Unless otherwise stated, this page is written by DTU Nanolab internal

Calibration of Physimeca

As of 16/6/2008 we will use a new system to compensate for "drift" without having to change e.g. 20 gold programs for each refilling. The power setting during deposition is a fraction of the "auto-emission current" on the genius system. In order to compensate for drift in the system the auto and max emission current on the genius is adjusted to achieve the rates at the set powers below This way it should not be necessary to adjust the programs every time, but experienced users will have to occasionally adjust the genius setting.

Reference deposition (step)	Material	Pocket	Rate (Å/s)	At power (%)	Example of max emission current (6-2008)
					mA	~mA for rate
Ti100nm-5A-cal	Ti	1	5	70	160	112
Pt100nm-5A-cal	Pt	2	5	80	460	368
Au100nm-10A-cal	Au	3	10	80	450	360
Ni100nm-5A-cal	Ni	4	5	70	250	175
Ge100nm-5A-cal	Ge	5	5	70	190	133
Cr100nm-5A-cal	Cr	6	5	70	110	77
Pd100nm-5A-cal	Pd	6	5	70	160	112

The tooling factor has been determined to ~110 for 100nm layers (lot, 6-2008). It will of course have a small dependence on material and rate.

You can use the steps above as starting point when making new programs (other thicknesses, rates, tilt etc.)

Changing auto and emission current (experienced users only)

If the actual power during deposition is significantly different than the target value (e.g. off by a few % you may change the genius values).

Calculate new auto emission current: Inew="good" current during deposition / target power, e.g. 167mA/0.7 = 240mA (new max emission)

1. Use genius remote:
2. Switch to manual mode.
3. Switch to chosen material
4. Go to set data and down to auto emission and max emission .
5. Change both to the new value and note this in the user log.
6. Go to save/load and save values
7. Switch back to remote mode on genius.