Specific Process Knowledge/Characterization/SEM LEO: Difference between revisions

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+{{cc-nanolab}}
 '''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Characterization/SEM_LEO0 click here]'''
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+'''<p style="color:red;">The SEM LEO  has been decomissioned and relocated to DTU Mechanics in 2020.</p>'''
+=SEM LEO=
-=The SEM LEO has been decommissioned and relocated to DTU Mechanics=
 [[image:IMG_3290.jpg|400x400px|right|thumb|The SEM LEO located in cleanroom F-2]]
-The SEM LEO is a scanning electron microscope. It is a very reliable and rugged instrument that provides high quality SEM  images of most samples, and it has excellently served the users of the cleanroom for many years. Excellent images on a large variety of materials such as semiconductors, semiconductor oxides or nitrides, metals, thin films and some polymers may be acquired on the SEM.
+The SEM LEO was a very reliable and rugged instrument that provided high quality SEM  images of most samples and it served the users of the cleanroom for many years. Excellent images on a large variety of materials such as semiconductors, semiconductor oxides or nitrides, metals, thin films and some polymers were acquired by the thousands on the SEM.
-However, the SEM LEO has now been equipped with a Raith e-beam lithography system, and from the turn of the year 2015-2016 it is exclusively dedicated to the users of the Raith E-beam lithography, so general imaging of user samples is no longer allowed.
-The SEM LEO is located in the cleanroom. It was installed in 1998, and the software was ungraded in 2012.
-'''The user manual, control instruction, the user APV and contact information can be found in LabManager:'''
-[http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=37 SEM LEO info page in LabManager],
-== Performance information ==
-*[[Specific Process Knowledge/Characterization/SEM: Scanning Electron Microscopy|SEM comparison page]]
-*[[Specific Process Knowledge/Lithography/EBeamLithography/RaithElphy|Raith Elphy e-beam lithography system]]
+In her later years the SEM LEO was equipped with a Raith e-beam lithography system and was exclusively dedicated to the users of the Raith E-beam lithography.
 ===Typical current values for EBL===