Specific Process Knowledge/Etch/DRIE-Pegasus/Etch 3 dimensional silicon microstructures: Difference between revisions

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* ''This work was done by Henri Jansen and Bingdong Chang in 2017;''
* ''This work was done by Henri Jansen and Bingdong Chang in 2017;''

Latest revision as of 10:21, 9 August 2022


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  • This work was done by Henri Jansen and Bingdong Chang in 2017;
  • This page was last edited by Bingdong Chang 24 October 2017.


By combining anisotropic Bosch process and isotropic etch process, 3 dimensional structures can be fabricated using DRIE-Pegasus, below is an example to show how 3D "sausage-chain-like" micropillars can be achieved. The patterns were defined with DUV lithography (1µm diameter structures with 2µm pitch size), the resist used was 750nm KRF M230Y positive DUV resist.

Using the similar methods, other types of 3D microstructures can be fabricated, below are some silicon structures etched with UV resist as a mask, the lithography step was performed with Aligner Maskless, with 1.5µm thick AZ nlof negative resist or 1.5µm AZ 5214 positive resist.

For more details, please contact Henri Jansen (henrija@dtu.dk) or Bingdong Chang (bincha@dtu.dk)