Specific Process Knowledge/Etch/Etching of Silicon Oxide/SiO2 etch using ASE/tests CHF3+H2: Difference between revisions
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|<!--'''Date'''--> 13/11/23 | |<!--'''Date'''--> 13/11/23 | ||
|<!--'''SEM picture'''--> [[File:nP CHF3_t1 22.5 10min 30WP-01.png|200px]] [[File:nP CHF3_t1 22.5 10min 30WP-03.png|200px]] | |<!--'''SEM picture'''--> [[File:nP CHF3_t1 22.5 10min 30WP-01.png|200px]] [[File:nP CHF3_t1 22.5 10min 30WP-03.png|200px]] | ||
|<!--'''Etch rate in SiO2'''--> | |<!--'''Etch rate in SiO2'''--> 47 | ||
|<!--'''Etch rate in resist'''--> | |<!--'''Etch rate in resist'''-->24.6 | ||
|<!--'''Selectivity (SiO2:resist)'''--> | |<!--'''Selectivity (SiO2:resist)'''--> 1.9 | ||
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|<!--'''Date'''--> 13/11/23 | |<!--'''Date'''--> 13/11/23 | ||
|<!--'''SEM picture'''--> [[File:nP CHF3_t1 22.5 10min 45WP-01.png|200px]] [[File:nP CHF3_t1 22.5 10min 45WP-04.png|200px]] | |<!--'''SEM picture'''--> [[File:nP CHF3_t1 22.5 10min 45WP-01.png|200px]] [[File:nP CHF3_t1 22.5 10min 45WP-04.png|200px]] | ||
|<!--'''Etch rate in SiO2'''--> | |<!--'''Etch rate in SiO2'''--> 59 | ||
|<!--'''Etch rate in resist'''--> | |<!--'''Etch rate in resist'''--> 30 | ||
|<!--'''Selectivity (SiO2:resist)'''--> | |<!--'''Selectivity (SiO2:resist)'''--> 1.9 | ||
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Revision as of 13:44, 14 December 2023
Recipes and results - CHF3 tests
Tests performed with AZ5214E resist: