Specific Process Knowledge/Etch/Etching of Silicon Oxide/SiO2 etch using ASE/tests CHF3+H2: Difference between revisions
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| Line 8: | Line 8: | ||
! '''Date''' | ! '''Date''' | ||
! '''SEM picture''' | ! '''SEM picture''' | ||
! '''Redeposition - top view''' | ! '''Redeposition - top view''' | ||
! '''Profile angles''' | ! '''Profile angles''' | ||
| Line 23: | Line 22: | ||
|<!--'''Date'''--> 04/09/2023 | |<!--'''Date'''--> 04/09/2023 | ||
|<!--'''SEM picture'''--> [[File:CHF3 t1 pat C 01.png|200px]] | |<!--'''SEM picture'''--> [[File:CHF3 t1 pat C 01.png|200px]] | ||
|<!--'''Redeposition - top view'''--> [[File:CHF3 t1 12min af PA 03.png|200px]] | |<!--'''Redeposition - top view'''--> [[File:CHF3 t1 12min af PA 03.png|200px]] | ||
|<!--'''Profile angles'''--> | |<!--'''Profile angles'''--> | ||
| Line 38: | Line 36: | ||
|<!--'''Date'''--> 04/09/2023 | |<!--'''Date'''--> 04/09/2023 | ||
|<!--'''SEM picture'''--> [[File:CHF3 t2 pat C 05.png|200px]] | |<!--'''SEM picture'''--> [[File:CHF3 t2 pat C 05.png|200px]] | ||
|<!--'''Redeposition - top view'''--> [[File:CHF3 t2 25min af PA 05.png|200px]] | |<!--'''Redeposition - top view'''--> [[File:CHF3 t2 25min af PA 05.png|200px]] | ||
|<!--'''Profile angles'''--> [[File:CHF3 t2 pat C 03.png|200px]] | |<!--'''Profile angles'''--> [[File:CHF3 t2 pat C 03.png|200px]] | ||
| Line 53: | Line 50: | ||
|<!--'''Date'''--> 22/09/2023 | |<!--'''Date'''--> 22/09/2023 | ||
|<!--'''SEM picture'''--> [[File:CHF3.t2-10H2-25min-C-01.png|200px]] | |<!--'''SEM picture'''--> [[File:CHF3.t2-10H2-25min-C-01.png|200px]] | ||
|<!--'''Redeposition - top view'''--> [[File:CHF3.t2 22.5H2 10min af PA 02.png|200px]] | |<!--'''Redeposition - top view'''--> [[File:CHF3.t2 22.5H2 10min af PA 02.png|200px]] | ||
|<!--'''Profile angles'''--> [[File:CHF3.t2-10H2-25min-C-08.png|200px]] | |<!--'''Profile angles'''--> [[File:CHF3.t2-10H2-25min-C-08.png|200px]] | ||
| Line 68: | Line 64: | ||
|<!--'''Date'''--> 12/09/2023 | |<!--'''Date'''--> 12/09/2023 | ||
|<!--'''SEM picture'''--> [[File:CHF310 H2 10min 08.png|200px]] | |<!--'''SEM picture'''--> [[File:CHF310 H2 10min 08.png|200px]] | ||
|<!--'''Redeposition - top view'''--> [[File:CHF310 H2 10min af PA top 01.png|200px]] | |<!--'''Redeposition - top view'''--> [[File:CHF310 H2 10min af PA top 01.png|200px]] | ||
|<!--'''Profile angles'''--> [[File:CHF310 H2 10min 10.png|200px]] | |<!--'''Profile angles'''--> [[File:CHF310 H2 10min 10.png|200px]] | ||
| Line 83: | Line 78: | ||
|<!--'''Date'''--> 11/09/2023 | |<!--'''Date'''--> 11/09/2023 | ||
|<!--'''SEM picture'''--> [[File:CHF310 O2 10min 01.png|200px]] | |<!--'''SEM picture'''--> [[File:CHF310 O2 10min 01.png|200px]] | ||
|<!--'''Redeposition - top view'''--> [[File:CHF310 O2 10min af PA top 02.png|200px]] | |<!--'''Redeposition - top view'''--> [[File:CHF310 O2 10min af PA top 02.png|200px]] | ||
|<!--'''Profile angles'''--> [[File:CHF310 O2 10min 04.png|200px]] | |<!--'''Profile angles'''--> [[File:CHF310 O2 10min 04.png|200px]] | ||
| Line 98: | Line 92: | ||
|<!--'''Date'''--> 20/09/2023 | |<!--'''Date'''--> 20/09/2023 | ||
|<!--'''SEM picture'''--> [[File:CHF3=22.5 H2 10min C 01.png|200px]] | |<!--'''SEM picture'''--> [[File:CHF3=22.5 H2 10min C 01.png|200px]] | ||
|<!--'''Redeposition - top view'''--> [[File:CHF3.t1 22.5H2 10min af PA 02.png|200px]] | |<!--'''Redeposition - top view'''--> [[File:CHF3.t1 22.5H2 10min af PA 02.png|200px]] | ||
|<!--'''Profile angles'''--> [[File:CHF3=22.5 H2 10min C 03.png|200px]] | |<!--'''Profile angles'''--> [[File:CHF3=22.5 H2 10min C 03.png|200px]] | ||
| Line 113: | Line 106: | ||
|<!--'''Date'''--> 22/09/2023 | |<!--'''Date'''--> 22/09/2023 | ||
|<!--'''SEM picture'''--> [[File:CHF3 35H2 10min C 02.png|200px]] | |<!--'''SEM picture'''--> [[File:CHF3 35H2 10min C 02.png|200px]] | ||
|<!--'''Redeposition - top view'''--> [[File:CHF3 35H2 10min af PA 01.png|200px]] | |<!--'''Redeposition - top view'''--> [[File:CHF3 35H2 10min af PA 01.png|200px]] | ||
|<!--'''Profile angles'''--> [[File:CHF3 35H2 10min D 05.png|200px]] | |<!--'''Profile angles'''--> [[File:CHF3 35H2 10min D 05.png|200px]] | ||
| Line 128: | Line 120: | ||
|<!--'''Date'''--> 22/09/2023 | |<!--'''Date'''--> 22/09/2023 | ||
|<!--'''SEM picture'''--> [[File:CHF3 3535H2 10min E 01.png|200px]] | |<!--'''SEM picture'''--> [[File:CHF3 3535H2 10min E 01.png|200px]] | ||
|<!--'''Redeposition - top view'''--> [[File:CHF3 35.35H2 10min af PA 01.png|200px]] | |<!--'''Redeposition - top view'''--> [[File:CHF3 35.35H2 10min af PA 01.png|200px]] | ||
|<!--'''Profile angles'''--> [[File:CHF3 3535H2 10min C 06.png|200px]] | |<!--'''Profile angles'''--> [[File:CHF3 3535H2 10min C 06.png|200px]] | ||
| Line 143: | Line 134: | ||
|<!--'''Date'''--> 22/09/2023 | |<!--'''Date'''--> 22/09/2023 | ||
|<!--'''SEM picture'''--> [[File:CHF3.t1 22.5CF4 10min C 01.png|200px]] | |<!--'''SEM picture'''--> [[File:CHF3.t1 22.5CF4 10min C 01.png|200px]] | ||
|<!--'''Redeposition - top view'''--> [[File:CHF3 22.5CF4 10min af PA 01.png|200px]] | |<!--'''Redeposition - top view'''--> [[File:CHF3 22.5CF4 10min af PA 01.png|200px]] | ||
|<!--'''Profile angles'''--> [[File:CHF3.t1 22.5CF4 10min C 03.png|200px]] | |<!--'''Profile angles'''--> [[File:CHF3.t1 22.5CF4 10min C 03.png|200px]] | ||
| Line 158: | Line 148: | ||
|<!--'''Date'''--> 22/09/2023 | |<!--'''Date'''--> 22/09/2023 | ||
|<!--'''SEM picture'''--> [[File:CHF3.t122.5H2 25mT 10m C 04.png|200px]] | |<!--'''SEM picture'''--> [[File:CHF3.t122.5H2 25mT 10m C 04.png|200px]] | ||
|<!--'''Redeposition - top view'''--> [[File:CHF3 22.5H2 25mT 10mn af PA 01.png|200px]] | |<!--'''Redeposition - top view'''--> [[File:CHF3 22.5H2 25mT 10mn af PA 01.png|200px]] | ||
|<!--'''Profile angles'''--> [[File:CHF3.t122.5H2 25mT 10m C 03.png|200px]] | |<!--'''Profile angles'''--> [[File:CHF3.t122.5H2 25mT 10m C 03.png|200px]] | ||
| Line 173: | Line 162: | ||
|<!--'''Date'''--> 22/09/2023 | |<!--'''Date'''--> 22/09/2023 | ||
|<!--'''SEM picture'''--> [[File:CHF3-22.5-H2-10min-0C-C-03.png|200px]] | |<!--'''SEM picture'''--> [[File:CHF3-22.5-H2-10min-0C-C-03.png|200px]] | ||
|<!--'''Redeposition - top view'''--> [[File:CHF3 22.5H2 10min 0C af PA 01.png|200px]] | |<!--'''Redeposition - top view'''--> [[File:CHF3 22.5H2 10min 0C af PA 01.png|200px]] | ||
|<!--'''Profile angles'''--> [[File:CHF3-22.5-H2-10min-0C-C-07.png|200px]] | |<!--'''Profile angles'''--> [[File:CHF3-22.5-H2-10min-0C-C-07.png|200px]] | ||
| Line 199: | Line 187: | ||
! '''Date''' | ! '''Date''' | ||
! '''SEM picture''' | ! '''SEM picture''' | ||
! '''Profile angles''' | ! '''Profile angles''' | ||
! '''Etch rate in SiO2''' | ! '''Etch rate in SiO2''' | ||
| Line 214: | Line 200: | ||
|<!--'''Date'''--> 04/09/2023 | |<!--'''Date'''--> 04/09/2023 | ||
|<!--'''SEM picture'''--> [[File:CHF3 t1 pat C 01.png|200px]] | |<!--'''SEM picture'''--> [[File:CHF3 t1 pat C 01.png|200px]] | ||
|<!--'''Profile angles'''--> | |<!--'''Profile angles'''--> | ||
|<!--'''Etch rate in SiO2'''--> 69.7 nm/min <br> +/- 10.5% | |<!--'''Etch rate in SiO2'''--> 69.7 nm/min <br> +/- 10.5% | ||
| Line 229: | Line 213: | ||
|<!--'''Date'''--> 04/09/2023 | |<!--'''Date'''--> 04/09/2023 | ||
|<!--'''SEM picture'''--> [[File:CHF3 t2 pat C 05.png|200px]] | |<!--'''SEM picture'''--> [[File:CHF3 t2 pat C 05.png|200px]] | ||
|<!--'''Profile angles'''--> [[File:CHF3 t2 pat C 03.png|200px]] | |<!--'''Profile angles'''--> [[File:CHF3 t2 pat C 03.png|200px]] | ||
|<!--'''Etch rate in SiO2'''--> 26.7 nm/min <br> +/- 11.9% | |<!--'''Etch rate in SiO2'''--> 26.7 nm/min <br> +/- 11.9% | ||
Revision as of 12:12, 14 December 2023
Recipes and results - CHF3 tests
Tests performed with AZ5214E resist:
| Recipe | Recipe parameters | Process time | Date | SEM picture | Redeposition - top view | Profile angles | Etch rate in SiO2 | Etch rate in resist (AZ5214E inverse) |
Selectivity (SiO2:resist) |
Etch rate in Si |
|---|---|---|---|---|---|---|---|---|---|---|
| CHF3_t1 | CHF3= 22.5 sccm Coil= 800W Platen= 15W Press= 2.5mTorr Temp= 20°C |
12:00 min | 04/09/2023 | 
|
|
69.7 nm/min +/- 10.5% |
57.3 nm/min +/- 12.9% |
1.22 | ||
| CHF3_t2 | CHF3= 22.5 sccm Coil= 150W Platen= 25W Press= 2.5mTorr Temp= 20°C |
25:00 min | 04/09/2023 | 
|
|
|
26.7 nm/min +/- 11.9% |
24.2 nm/min +/- 21.1% |
1.1 | |
| CHF3 t2 | CHF3= 22.5 sccm H2= 22.5 sccm Coil= 150W Platen= 25W Press= 2.5mTorr Temp= 20°C |
10:00 min | 22/09/2023 | 
|
|
|
9,7 nm/min +/- 34.4% |
1,8 nm/min +/- 46.5% |
5.4 | |
| CHF3_t1 | CHF3= 22.5 sccm H2= 10 sccm Coil= 800W Platen= 15W Press= 2.5mTorr Temp= 20°C |
10:00 min | 12/09/2023 | 
|
|
|
59,6 nm/min +/- 12.9% |
47,5 nm/min +/- 21.5% |
1.25 | |
| CHF3_t1 | CHF3= 22.5 sccm O2= 10 sccm Coil= 800W Platen= 15W Press= 2.5mTorr Temp= 20°C |
10:00 min | 11/09/2023 | 
|
|
|
60,6 nm/min +/- 10.1% |
130,8 nm/min +/- 8.8% |
0.46 | |
| CHF3 t1 | CHF3= 22.5 sccm H2= 22.5 sccm Coil= 800W Platen= 15W Press= 2.5mTorr Temp= 20°C |
10:00 min | 20/09/2023 | 
|
|
|
47,3 nm/min +/- 12% |
26,4 nm/min +/- 17,4% |
1.8 | |
| CHF3 t1 | CHF3= 22.5 sccm H2= 35 sccm Coil= 800W Platen= 15W Press= 2.5mTorr Temp= 20°C |
10:00 min | 22/09/2023 | 
|
|
|
36,5 nm/min +/- 10.6% |
17,5 nm/min +/- 13.9% |
2.09 | |
| CHF3 t1 | CHF3= 35 sccm H2= 35 sccm Coil= 800W Platen= 15W Press= 2.5mTorr Temp= 20°C |
10:00 min | 22/09/2023 | 
|
|
|
42 nm/min +/- 15.4% |
23,8 nm/min +/- 22.2% |
1.76 | |
| CHF3 t1 | CHF3= 22.5 sccm CF4= 22.5 sccm Coil= 800W Platen= 15W Press= 2.5mTorr Temp= 20°C |
10:00 min | 22/09/2023 | 
|
|
|
75,8 nm/min +/- 13.1% |
74,9 nm/min +/- 10.8% |
1.01 | |
| CHF3 t1 | CHF3= 22.5 sccm H2= 22.5 sccm Coil= 800W Platen= 15W Press= 25mTorr Temp= 20°C |
10:00 min | 22/09/2023 | 
|
|
|
- | - | no etch done, polymer deposited |
|
| CHF3 t1 | CHF3= 22.5 sccm H2= 22.5 sccm Coil= 800W Platen= 15W Press= 2.5mTorr Temp= 0°C |
10:00 min | 22/09/2023 | 
|
|
|
48 nm/min +/- 11.2% |
23,3 nm/min +/- 13.7% |
2.06 |
Tests performed with 915nm UVN resist + 88nm BARC:
| Recipe | Recipe parameters | Process time | Date | SEM picture | Profile angles | Etch rate in SiO2 | Etch rate in resist (AZ5214E inverse) |
Selectivity (SiO2:resist) |
Etch rate in Si |
|---|---|---|---|---|---|---|---|---|---|
| CHF3_t1 | CHF3= 22.5 sccm Coil= 800W Platen= 15W Press= 2.5mTorr Temp= 20°C |
12:00 min | 04/09/2023 |
|
69.7 nm/min +/- 10.5% |
57.3 nm/min +/- 12.9% |
1.22 | ||
| CHF3_t2 | CHF3= 22.5 sccm Coil= 150W Platen= 25W Press= 2.5mTorr Temp= 20°C |
25:00 min | 04/09/2023 |
|
|
26.7 nm/min +/- 11.9% |
24.2 nm/min +/- 21.1% |
1.1 |