Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-4/SiO2 Etch/Cr mask: Difference between revisions
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<gallery caption="EM tests with Cr mask on full wafer 6 min etch" perrow=" | <gallery caption="EM tests with Cr mask on full wafer 6 min etch" perrow="6" widths="200px" heights="150px"> | ||
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<gallery caption="EM tests with Cr mask on wafer piece on Si carrier 6 min etch" perrow="6" widths="200px" heights="150px"> | |||
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<gallery caption="EM tests with Cr mask on full wafer 6 min etch" perrow="6" widths="200px" heights="150px"> | |||
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<gallery caption="EM tests with Cr mask on full wafer 6 min etch" perrow="6" widths="200px" heights="150px"> | |||
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Revision as of 13:52, 21 September 2023
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Unless otherwise stated, all content in this section was done by Berit Herstrøm, DTU Nanolab
- EM tests with Cr mask on full wafer 6 min etch
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- EM tests with Cr mask on wafer piece on Si carrier 6 min etch
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- EM tests with Cr mask on full wafer 6 min etch
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- EM tests with Cr mask on full wafer 6 min etch
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