Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-4/SiO2 Etch/EM with resist mask: Difference between revisions
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==Looking at bit on the effect of using electromagnets for etching SiO2 with DUV resist== | ==Looking at bit on the effect of using electromagnets for etching SiO2 with DUV resist== | ||
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Revision as of 09:27, 11 September 2023
Looking at bit on the effect of using electromagnets for etching SiO2 with DUV resist
Unless otherwise stated, all content in this section was done by Berit Herstrøm, DTU Nanolab