Specific Process Knowledge/Etch/DRIE-Pegasus/Isotropic/mediumiso1: Difference between revisions
Created page with " {| border="2" cellpadding="0" cellspacing="0" style="text-align:center;" |+ '''Process runs''' |- ! rowspan="2" width="40"| Date ! colspan="4" width="120"| Substrate Informat..." |
No edit summary |
||
| (9 intermediate revisions by the same user not shown) | |||
| Line 1: | Line 1: | ||
'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Etch/DRIE-Pegasus/Isotropic/mediumiso1 click here]''' | |||
<!--Checked for updates on 30/7-2018 - ok/jmli --> | |||
<!--Checked for updates on 2/10-2020 - ok/jmli --> | |||
<!--Checked for updates on 28/6-2023 - ok/jmli --> | |||
{{contentbydryetch}} | |||
{| border="2" cellpadding="0" cellspacing="0" style="text-align:center;" | {| border="2" cellpadding="0" cellspacing="0" style="text-align:center;" | ||
| Line 32: | Line 38: | ||
[[file:S003961-04.jpg |120px|frameless ]] | [[file:S003961-04.jpg |120px|frameless ]] | ||
[[file:S003961-05.jpg |120px|frameless ]] | [[file:S003961-05.jpg |120px|frameless ]] | ||
|- | |||
| 6/6-2016 | |||
| 6" | |||
| travka35 wafer 1.5 µm AZ | |||
| Si / 35 % | |||
| Pegasus/jmli | |||
| | |||
| standard/danchip/mediumiso1 2:00 minutes | |||
| S006534 | |||
| | |||
| | |||
[[file:S006534 064.jpg |120px|frameless ]] | |||
[[file:S006534 065.jpg |120px|frameless ]] | |||
[[file:S006534 067.jpg |120px|frameless ]] | |||
[[file:S006534 068.jpg |120px|frameless ]] | |||
|- | |||
| 6/6-2016 | |||
| 6" | |||
| travka35 wafer 1.5 µm AZ | |||
| Si / 35 % | |||
| Pegasus/jmli | |||
| | |||
| standard/danchip/mediumiso1 4:00 minutes | |||
| S006535 | |||
| | |||
| | |||
[[file:S006535 066.jpg |120px|frameless ]] | |||
[[file:S006535069.jpg |120px|frameless ]] | |||
[[file:S006534 067.jpg |120px|frameless ]] | |||
[[file:S006534 068.jpg |120px|frameless ]] | |||
|- | |- | ||
|} | |} | ||
Latest revision as of 12:31, 28 June 2023
Feedback to this page: click here
Unless otherwise stated, the content of this page was created by the dry etch group at DTU Nanolab
| Date | Substrate Information | Process Information | SEM Images | ||||||
|---|---|---|---|---|---|---|---|---|---|
| Wafer info | Mask | Material/ Exposed area | Tool / Operator | Conditioning | Recipe | Wafer ID | Comments | ||
| 9/4-2014 | 4" | travka05 wafer 1.5 µm AZ | Si / 5 % | Pegasus/jmli | 5 minute TDESC clean + MU runs | jml/isotropic/mediumiso1 2:00 minutes | S003961 |
| |
| 6/6-2016 | 6" | travka35 wafer 1.5 µm AZ | Si / 35 % | Pegasus/jmli | standard/danchip/mediumiso1 2:00 minutes | S006534 |
| ||
| 6/6-2016 | 6" | travka35 wafer 1.5 µm AZ | Si / 35 % | Pegasus/jmli | standard/danchip/mediumiso1 4:00 minutes | S006535 |
| ||
