Specific Process Knowledge/Characterization/SEM Supra 1: Difference between revisions

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=<span style="background:#FF2800">THIS PAGE IS UNDER CONSTRUCTION</span>[[image:Under_construction.png|200px]]=
'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Characterization/SEM_Supra_1  click here]'''
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''This page is written by DTU Nanolab  internal''


'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Characterization/SEM_Supra_1  click here]'''
[[image:LA_SEM_Supra_1.jpg|400x400px|right|thumb|The SEM Supra 1 located in basement 346-907.{{photo1}} ]]
 
=SEM Supra 1=


[[image:LA_SEM_Supra_1.jpg|300x300px|right|thumb|The SEM Supra 1]]
The SEM Supra 1 a scanning electron microscope. It produces enlarged images of a variety of specimens, achieving magnifications of over 500.000x providing ultra high resolution imaging. This important and widely used analytical tool provides exceptional resolution and depth of field and requires minimal specimen preparation.


=SEM LEO=
The SEM is a VP (variable pressure) instrument - Indicating that it is capable of operating at variable pressure. By increasing the pressure in the chamber it is possible to image isolating samples. The higher density of gas molecules will eliminate the charges at the cost of slightly reduced resolution. Also, the Se2 and InLens detectors will no longer work.


[[image:IMG_3290.jpg|400x400px|right|thumb|The SEM LEO]]
The SEM is the training for fabrication SEM at DTU Nanolab. It means that all new SEM users with no or little SEM experience must be trained on this tool and gain basic knowledge here before being qualified for training on other SEM's.


The SEM LEO is a scanning electron microscope. It is a very reliable and rugged instrument that provides high quality SEM  images of most samples, and it has excellently served the users of the cleanroom for many years. Excellent images on a large variety of materials such as semiconductors, semiconductor oxides or nitrides, metals, thin films and some polymers may be acquired on the SEM.  
The SEM Supra 1 was installed in the cleanroom in November 2010, but it has now been relocated in the basement outside the cleanroom, so that users can avoid to clean samples that have been outside the cleanroom before SEM inspection.  


However, the SEM LEO has now been equipped with a Raith e-beam lithography system, and from the turn of the year 2015-2016 it is exclusively dedicated to the users of the Raith E-beam lithography, so system so general imaging of user samples is no longer allowed.
The Balzer Sputter is located in the same room as the SEM Supra 1 and can be used to cover samples (for instance polymer samples from the Polymer Injection Molding tool) with a thin gold layer before SEM inspection to avoid charging problems.  


The SEM LEO was installed in the cleanroom in the 1998, and the software was ungraded in 2012.  
Only users with samples that are somehow related to the cleanroom can use this SEM. Other users will have to contact DTU CEN.  




'''The user manual, control instruction, the user APV and contact information can be found in LabManager:'''
'''The user manual, control instruction, the user APV and contact information can be found in LabManager:'''


[http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=37 SEM LEO info page in LabManager],
[http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=275 SEM Supra 1 info page in LabManager],




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*[[Specific Process Knowledge/Characterization/SEM: Scanning Electron Microscopy|SEM comparison page]]
*[[Specific Process Knowledge/Characterization/SEM: Scanning Electron Microscopy|SEM comparison page]]


*[[Specific Process Knowledge/Lithography/EBeamLithography/RaithElphy|Raith Elphy e-beam lithography system]]


==Equipment performance and process related parameters==
==Equipment performance==


{| border="2" cellspacing="0" cellpadding="2"  
{| border="2" cellspacing="0" cellpadding="2"  
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|style="background:LightGrey; color:black"|Imaging and measurement of
|style="background:LightGrey; color:black"|Imaging and measurement of
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*Any sample except bulk insulators such as polymers, glass or quartz wafers
* Conducting samples
* Semi-conducting samples
* Thin (~ 5 µm <) layers of non-conducting materials such as polymers
* Thick polymers, glass or quartz samples
|-
|-
!style="background:silver; color:black;" align="center" width="60"|Location  
!style="background:silver; color:black;" align="center" width="60"|Location  
|style="background:LightGrey; color:black"|
|style="background:LightGrey; color:black"|
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*Basement of DTU Danchip
*Basement of building 346
|-
|-
!style="background:silver; color:black;" align="center" width="60"|Performance
!style="background:silver; color:black;" align="center" width="60"|Performance
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*Any standard cleanroom material and samples from the Laser Micromachining tool and the Polymer Injection Molding tool
*Any standard cleanroom material and samples from the Laser Micromachining tool and the Polymer Injection Molding tool
|-  
|-  
|}
===Quality control of length measurement ===
{| border="1" cellspacing="2" cellpadding="2" colspan="3"
|bgcolor="#98FB98" |'''Quality Control (QC) for SEM Supra 1'''
|-
|
*[http://labmanager.dtu.dk/d4Show.php?id=2493&mach=275 QC procedure for SEM Supra 1]<br>
*[https://labmanager.dtu.dk/view_binary.php?type=data&mach=275 Newest QC data for SEM Supra 1]<br>
'''QC limits:'''
{| {{table}}
| align="center" valign="top"|
{| border="2" cellspacing="1" cellpadding="2" align="center" style="width:500px"
! Detector
! Settings
! Magnification
! Measured dimensions
! Calibration limit
! Action limit
|-
|SE2
| EHT 10 kV, WD 10 mm
| 2.500 k
| 70x70 μm
| ± 2 %
| ± 3 %
|-
|SE2
| EHT 10 kV, WD 10 mm
| 17.000 k
| 10x10 μm
| ± 2 %
| ± 3 %
|-
|SE2
| EHT 5 kV, WD 5 mm
| 17.000 k
| 10x10 μm
| ± 2 %
| ± 3 %
|-
| VPSE
| EHT 10 kV, WD 10 mm, 17 Pa
| 17.000 k
| 10x10 μm
| ± 2 %
| ± 3 %
|-
| InLens
| EHT 5 kV, WD 5 mm
| 200.000 k
| 1x1 μm
| ± 2 %
| ± 3 %
|-
| InLens
| EHT 10 kV, WD 3 mm
| 1.000.000 k
| (imaging only)
| NA
| NA
|-
|}
|-
|}
|}
|}

Latest revision as of 10:48, 28 June 2023

Feedback to this page: click here

This page is written by DTU Nanolab internal

The SEM Supra 1 located in basement 346-907.Photo: DTU Nanolab internal

SEM Supra 1

The SEM Supra 1 a scanning electron microscope. It produces enlarged images of a variety of specimens, achieving magnifications of over 500.000x providing ultra high resolution imaging. This important and widely used analytical tool provides exceptional resolution and depth of field and requires minimal specimen preparation.

The SEM is a VP (variable pressure) instrument - Indicating that it is capable of operating at variable pressure. By increasing the pressure in the chamber it is possible to image isolating samples. The higher density of gas molecules will eliminate the charges at the cost of slightly reduced resolution. Also, the Se2 and InLens detectors will no longer work.

The SEM is the training for fabrication SEM at DTU Nanolab. It means that all new SEM users with no or little SEM experience must be trained on this tool and gain basic knowledge here before being qualified for training on other SEM's.

The SEM Supra 1 was installed in the cleanroom in November 2010, but it has now been relocated in the basement outside the cleanroom, so that users can avoid to clean samples that have been outside the cleanroom before SEM inspection.

The Balzer Sputter is located in the same room as the SEM Supra 1 and can be used to cover samples (for instance polymer samples from the Polymer Injection Molding tool) with a thin gold layer before SEM inspection to avoid charging problems.

Only users with samples that are somehow related to the cleanroom can use this SEM. Other users will have to contact DTU CEN.


The user manual, control instruction, the user APV and contact information can be found in LabManager:

SEM Supra 1 info page in LabManager,


Performance information


Equipment performance

Equipment SEM Supra 1 (Supra 40VP SEM)
Purpose Imaging and measurement of
  • Conducting samples
  • Semi-conducting samples
  • Thin (~ 5 µm <) layers of non-conducting materials such as polymers
  • Thick polymers, glass or quartz samples
Location
  • Basement of building 346
Performance Resolution
  • 1-2 nm (limited by vibrations)

The resolution is strongly dependent on the type of sample and the skills of the operator.

Instrument specifics Detectors
  • Secondary electron (Se2)
  • Inlens secondary electron (Inlens)
  • 4 Quadrant Backscatter electron (QBSD)
  • Variable pressure secondary electron (VPSE)
Stage
  • X, Y: 130 × 130 mm
  • T: -4 to 70o
  • R: 360o
  • Z: 50 mm
Electron source
  • FEG (Field Emission Gun) source
Operating pressures
  • Fixed at High vacuum (2 × 10-4mbar - 10-6mbar)
  • Variable at Low vacuum (0.1 mbar - 2 mbar)
Options
  • All software options available
Substrates Batch size
  • Up to 6" wafer with full view
Allowed materials
  • Any standard cleanroom material and samples from the Laser Micromachining tool and the Polymer Injection Molding tool

Quality control of length measurement

Quality Control (QC) for SEM Supra 1

QC limits:

Detector Settings Magnification Measured dimensions Calibration limit Action limit
SE2 EHT 10 kV, WD 10 mm 2.500 k 70x70 μm ± 2 % ± 3 %
SE2 EHT 10 kV, WD 10 mm 17.000 k 10x10 μm ± 2 % ± 3 %
SE2 EHT 5 kV, WD 5 mm 17.000 k 10x10 μm ± 2 % ± 3 %
VPSE EHT 10 kV, WD 10 mm, 17 Pa 17.000 k 10x10 μm ± 2 % ± 3 %
InLens EHT 5 kV, WD 5 mm 200.000 k 1x1 μm ± 2 % ± 3 %
InLens EHT 10 kV, WD 3 mm 1.000.000 k (imaging only) NA NA