Specific Process Knowledge/Thermal Process/Oxide mask: Difference between revisions
No edit summary |
|||
| (2 intermediate revisions by the same user not shown) | |||
| Line 1: | Line 1: | ||
'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Thermal_Process/Oxide_mask click here]''' | |||
''This page is written by DTU Nanolab internal'' | |||
==Oxide mask thickness== | ==Oxide mask thickness== | ||
A thermal oxide mask can protect areas from diffusion during a pre deposition and drive-in process. It can also be used during a PECVD based diffusion process. The required oxide thickness differs for phosphorous and boron diffusion as the respective diffusion coefficients are different. The figures below indicate the minimum thermal oxide thickness to be used based on temperature and diffusion time. | A thermal oxide mask can protect areas from diffusion during a pre deposition and drive-in process. It can also be used during a PECVD based diffusion process. The required oxide thickness differs for phosphorous and boron diffusion as the respective diffusion coefficients are different. The figures below indicate the minimum thermal oxide thickness to be used based on temperature and diffusion time. | ||
https://labmanager.dtu.dk/view_binary.php?class=MiscDocument&id=9&name=Boron-mask.png | https://labmanager.dtu.dk/view_binary.php?class=MiscDocument&id=9&name=Boron-mask.png | ||
https://labmanager.dtu.dk/view_binary.php?class=MiscDocument&id=9&name=Phosphorous-mask.png | https://labmanager.dtu.dk/view_binary.php?class=MiscDocument&id=9&name=Phosphorous-mask.png | ||
Latest revision as of 10:05, 15 June 2023
Feedback to this page: click here
This page is written by DTU Nanolab internal
Oxide mask thickness
A thermal oxide mask can protect areas from diffusion during a pre deposition and drive-in process. It can also be used during a PECVD based diffusion process. The required oxide thickness differs for phosphorous and boron diffusion as the respective diffusion coefficients are different. The figures below indicate the minimum thermal oxide thickness to be used based on temperature and diffusion time.
https://labmanager.dtu.dk/view_binary.php?class=MiscDocument&id=9&name=Boron-mask.png
https://labmanager.dtu.dk/view_binary.php?class=MiscDocument&id=9&name=Phosphorous-mask.png