Specific Process Knowledge/Etch/Etching of Silicon Oxide/SiO2 etch using ASE/ICP recipe for SiO2: Difference between revisions
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|155 nm/min in the center, 125nm/min in the edges | |155 nm/min in the center, 125nm/min in the edges | ||
(03052023 mfarin @ DTU nanolab) | (03052023 mfarin @ DTU nanolab) | ||
|194 nm/min | |194 nm/min (24052023 mfarin @ DTU nanolab) | ||
|190 nm/min | |190 nm/min (24052023 mfarin @ DTU nanolab) | ||
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Revision as of 16:52, 30 May 2023
Unless otherwise stated, all content in this section was done by Maria Farinha@DTU Nanolab, May 2023
This recipe was taken from the ICP Metal etch, with a slight difference in the platen temperature.
Parameter | Recipe name: SiO2_ICP |
---|---|
Coil Power [W] | 1000 |
Platen Power [W] | 200 |
Platen temperature [oC] | 20 |
C4F8 flow [sccm] | 10 |
H2 flow [sccm] | 28 |
Pressure [mTorr] | 2.5 |
Results when etching a patterned wafer
- More tests will be done regarding silicon and silicon nitride, since this recipe can be used for overetch.