Specific Process Knowledge/Etch/ICP Metal Etcher/silicon oxide/By Peixiong/images CF4: Difference between revisions

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'''''All images on this page has been created by Peixiong Shi, DTU Nanolab''''' <br>
==Images stepper_6A1_feb262013_step9==
==Images stepper_6A1_feb262013_step9==
<gallery caption="6A1_feb262013_step9" widths="200px" heights="150px" perrow="4">
<gallery caption="6A1_feb262013_step9" widths="200px" heights="150px" perrow="4">
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image:10mm from wf edge_089.jpg|wafer edge
image:10mm from wf edge_089.jpg|wafer edge
image:10mm from wf edge_090.jpg|wafer edge
image:10mm from wf edge_090.jpg|wafer edge
image:10mm from wf edge_091.jpg|wafer edge
image:10mm from wf edge_091.jpg|Position of the scanning: wafer edge
image:10mm from wf edge_092.jpg|wafer edge
image:10mm from wf edge_092.jpg|wafer edge
image:10mm from wf edge_093.jpg|wafer edge
image:10mm from wf edge_093.jpg|wafer edge

Latest revision as of 15:21, 22 March 2023

All images on this page has been created by Peixiong Shi, DTU Nanolab

Images stepper_6A1_feb262013_step9

Images stepper_6A4_feb262013_step9

Images Stepper_6A5_feb272013

images 3