Specific Process Knowledge/Back-end processing/Polishing machine: Difference between revisions

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Unless anything else is stated, everything on this page, text and pictures are made by DTU Nanolab.

All links Labmanager requires login.

Polisher/Lapper

The Logitech PM5 Polisher/Lapper is for thinning down wafers and other substrates.

The user manual, user APV, technical information and contact information can be found in LabManager:

The Logitech PM5 Polisher/Lapper in LabManager

Equipment performance and process related parameters

Equipment		Polisher/Lapper
Purpose	Thinning of substrates of	InP GaAs Silicon Metals Glass/Quartz
Performance	Thinning	Removal rate: 1-10µm/min Thickness accuracy: +/- 10 µm Thickness homogeneity: +/- 10 µm Roughness: +/- ? µm
Performance	Polishing	Removal rate: ~1 µm/min Thickness accuracy: ? µm Thickness homogeneity: ? µm Roughness: +/- ? µm
Process parameter range	Polishing liquid	Al2O3 (alumina) powder: 3, 9 or 20 µm Chemlox (for polishing) SF1 Polishing Fluid (for polishing e.g. SiO2)
	Polishing cloths	Chemcloth Polishing Cloths (for use with SF1 liquid)
	Rotation speed	Thinning: 5-20 rpm Polishing: 5-80 rpm
	Arm sweep	Thinning: stationary Polishing: 12% (inner) - 80% (outer)
Substrates	Batch size	# small samples one 50 mm wafer one 100 mm wafer
	Allowed materials	InP GaAs Silicon Metals Glass/Quartz

@@ Line 2: / Line 2: @@
 <!-- Replace "http://labadviser.danchip.dtu.dk/..." wih the link to the Labadviser page-->
-== Polisher/Lapper [[Image:section under construction.jpg|70px]] ==
+'''Unless anything else is stated, everything on this page, text and pictures are made by DTU Nanolab.'''
+'''All links Labmanager requires login.'''
+== Polisher/Lapper ==
+<!-- copyright issue rkc -->
+<!-- copyright issue rkc [[image:Logitech pm5 1.jpg|400px|right|thumb|The Logitech PM5 Polisher/Lapper]]
+Training is required before using th machine. The machine is equipped with a LabManager lock.-->
 The Logitech PM5 Polisher/Lapper is for thinning down wafers and other substrates.
-'''The user manual(s), quality control procedure(s) and results, user APV(s), technical information and contact information can be found in LabManager:'''
+'''The user manual, user APV, technical information and contact information can be found in LabManager:'''
 <!-- remember to remove the type of documents that are not present -->
-[[image:Logitech pm5 1.jpg|500px|right|thumb|The Logitech PM5 Polisher/Lapper (not there yet)]]
 <!-- give the link to the equipment info page in LabManager: -->
 [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=299 The Logitech PM5 Polisher/Lapper in LabManager]
+==Equipment performance and process related parameters==
+[[File:IMG_20230228_113121.jpg|thumb|350px|PM5 lapper in Fume hood]]
+{| border="2" cellspacing="0" cellpadding="2"
+!colspan="2" border="none" style="background:silver; color:black;" align="center"|Equipment
+|style="background:WhiteSmoke; color:black"|<b>Polisher/Lapper</b>
+<!-- |style="background:WhiteSmoke; color:black"|<b>Equipment 2</b> -->
+|-
+!style="background:silver; color:black;" align="center" width="60"|Purpose
+|style="background:LightGrey; color:black"|
+Thinning of substrates of
+|style="background:WhiteSmoke; color:black"|
+*InP
+*GaAs
+*Silicon
+*Metals
+*Glass/Quartz
+<!-- |style="background:WhiteSmoke; color:black"|
+*Purpose 1
+*Purpose 2
+*Purpose 3 -->
+|-
+!style="background:silver; color:black" align="center" valign="center" rowspan="2"|Performance
+|style="background:LightGrey; color:black"| Thinning
+|style="background:WhiteSmoke; color:black"|
+*Removal rate: 1-10µm/min
+*Thickness accuracy: +/- 10 µm
+*Thickness homogeneity: +/- 10 µm
+*Roughness: +/- ? µm
+<!-- |style="background:WhiteSmoke; color:black"|
+*Performance range 1
+*Performance range 2
+*Performance range 3 -->
+|-
+|style="background:LightGrey; color:black"|Polishing
+|style="background:WhiteSmoke; color:black"|
+*Removal rate: ~1 µm/min
+*Thickness accuracy: ? µm
+*Thickness homogeneity: ? µm
+*Roughness: +/- ? µm
+<!-- |style="background:WhiteSmoke; color:black"|
+*Performance range -->
+|-
+!style="background:silver; color:black" align="center" valign="center" rowspan="4"|Process parameter range
+|style="background:LightGrey; color:black"|Polishing liquid
+|style="background:WhiteSmoke; color:black"|
+*Al2O3 (alumina) powder: 3, 9 or 20 µm
+*Chemlox (for polishing)
+*SF1 Polishing Fluid (for polishing e.g. SiO2)
+|-
+|style="background:LightGrey; color:black"|Polishing cloths
+|style="background:WhiteSmoke; color:black"|
+*Chemcloth Polishing Cloths (for use with SF1 liquid)
+|-
+|style="background:LightGrey; color:black"|Rotation speed
+|style="background:WhiteSmoke; color:black"|
+*Thinning: 5-20 rpm
+*Polishing: 5-80 rpm
+|-
+|style="background:LightGrey; color:black"|Arm sweep
+|style="background:WhiteSmoke; color:black"|
+*Thinning: stationary
+*Polishing: 12% (inner) - 80% (outer)
+|-
+!style="background:silver; color:black" align="center" valign="center" rowspan="3"|Substrates
+|style="background:LightGrey; color:black"|Batch size
+|style="background:WhiteSmoke; color:black"|
+*<nowiki>#</nowiki> small samples
+*one 50 mm wafer
+*one 100 mm wafer
+<!-- |style="background:WhiteSmoke; color:black"|
+*<nowiki>#</nowiki> small samples
+*<nowiki>#</nowiki> 50 mm wafers
+*<nowiki>#</nowiki> 100 mm wafers
+*<nowiki>#</nowiki> 150 mm wafers -->
+|-
+| style="background:LightGrey; color:black"|Allowed materials
+|style="background:WhiteSmoke; color:black"|
+*InP
+*GaAs
+*Silicon
+*Metals
+*Glass/Quartz
+<!-- |style="background:WhiteSmoke; color:black"|
+*Allowed material 1
+*Allowed material 2
+*Allowed material 3 -->
+|-
+|}
+[[File:IMG_20230228_113134.jpg|thumb|left|300px|lapping jig]]
+[[File:IMG_20230228_113127.jpg|thumb|1000px|mounting/measuring space]]
 <br clear="all" />