Revision as of 20:46, 18 February 2023

This page is written by Evgeniy Shkondin @DTU Nanolab if nothing else is stated.
All images and photos on this page belongs to DTU Nanolab.
The fabrication and characterization described below were conducted in 2021-2022 by Evgeniy Shkondin.

Cr Sputtering

This page presents the results of Cr deposition using DC sputtering in Sputter-System Lesker, now commonly known as "Old Lesker". The deposition target is Cr. Source #2 (DC) was used.

The fabrication and characterization described below were conducted in 2021 by Evgeniy Shkondin, DTU Nanolab. The prepared samples were investigated by the X-ray Reflectivity method. The focus of the study was the deposition conditions.

The process recipe in a Sputter-System (Lesker) is following:

Deposition type: DC
Power: 220 W.
Pressure: 3 mTorr
Gas: Ar
Deposition time: 360
Temperature: 20°C (no heating)
Measured DC bias: 360V

Deposition Rate: 0.148 nm/s

XRR-measurement

Layer parameter list
Layer name	Thickness (nm)	Density (g/cm³)	Rougness (nm)	Delta	Beta
Moisture	1.73	0.99	0.00	3.0119e-6	6.9942e-8
Cr₂O₃	4.36	2.96	0.00	8.9602e-6	6.2352e-7
Cr	48.99	6.19	2.93	1.8194e-5	1.8712e-6
SiO₂ (native oxide)	2.34	3.02	1.92	9.8053e-6	1.2778e-7
Si (wafer)	$\infty$	2.328	0.00	7.5795e-6	1.7601e-7

XRR analysis of Cr thin film.
X-ray reflectivity. Measurement and Fit.

@@ Line 1: / Line 1: @@
+<i>This page is written by <b>Evgeniy Shkondin @DTU Nanolab</b> if nothing else is stated. <br>
+All images and photos on this page belongs to <b>DTU Nanolab</b>.<br>
+The fabrication and characterization described below were conducted in <b>2021-2022 by Evgeniy Shkondin</b>.<br></i>
 =Cr Sputtering=