Specific Process Knowledge/Characterization/Probe station: Difference between revisions

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==Probe Station==
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==Probe station==
==Probe station==
[[Image:probe2.jpg|thumb|300x300px|Probe station. Positioned in serviceroom CX1]]
[[Image:probe2.jpg|thumb|300x300px|Probe station. Positioned in serviceroom CX1]]


The purpose is to measure the thickness of wafers, depths of larger grooves or height of larger mesas.  
'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Characterization/Probe_station click here]'''


During a KOH etch it can be helpful to ensure no over-etching by making a thickness measurement during the etching.
The Probe station is a - EPS150Triax - Cascade. The purpose is to measure I/V measurement, ohmic measurements etc. It has 4 individually adjustable triax connected probes, but can be fitted with additional coax connected probes. The stage can be moved in x and y to step and repeat a measurement over a large number of chips.
 
Samples can be inspected by either a microscope and/or a camera. 
 
Two Keithley 2450 source meters are connected to the probe station by triax cables. An additional Keithley 2410 source meter and a Keithley 2000 multi meter is connected by coax cables. All Keithleys can also be connected with banana wires.


==Equipment performance and process related parameters==
==Equipment performance and process related parameters==
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Purpose  
Purpose  
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Thickness measurer
Electrical measurements
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*Wafer thickness
*I/V
*Depths of larger grooves
*Resistance
*Heigth of larger mesas
*Data collection by PC possible
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Performance
Performance
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Thickness resolution
Pad size
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*< 5 µm
*100x100µm or more
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The Probe station is a - EPS150Triax - Cascade for I/V measurement, ohmic measurements etc, it has 4 individually adjustable probes, but can be fitted with more. It has several source meters, multi meters and a computer attached. 


It can be used from pieces up to 6" wafers
[[Image:probestation.jpg|thumb|300x300px|Probe station: positioned in Service room CX1]]


'''The user manual, technical information and contact information can be found in LabManager:'''
'''The user manual, technical information and contact information can be found in LabManager:'''


'''[http://www.labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=343 Probe station]'''
'''[http://www.labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=343 Probe station]'''

Latest revision as of 16:29, 6 February 2023

Unless anything else is stated, everything on this page, text and pictures are made by DTU Nanolab.

All links to Kemibrug (SDS) and Labmanager Including APV and QC requires login.

Probe station

Probe station. Positioned in serviceroom CX1

Feedback to this page: click here

The Probe station is a - EPS150Triax - Cascade. The purpose is to measure I/V measurement, ohmic measurements etc. It has 4 individually adjustable triax connected probes, but can be fitted with additional coax connected probes. The stage can be moved in x and y to step and repeat a measurement over a large number of chips.

Samples can be inspected by either a microscope and/or a camera.

Two Keithley 2450 source meters are connected to the probe station by triax cables. An additional Keithley 2410 source meter and a Keithley 2000 multi meter is connected by coax cables. All Keithleys can also be connected with banana wires.

Equipment performance and process related parameters

Purpose

Electrical measurements

  • I/V
  • Resistance
  • Data collection by PC possible

Performance

Pad size

  • 100x100µm or more

Substrates

Batch size

  • One sample
Substrate materials allowed
  • No restrictions



The user manual, technical information and contact information can be found in LabManager:

Probe station

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