Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange/ProcessD/PrD01: Difference between revisions
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| 10 minute TDESC clean | | 10 minute TDESC clean | ||
| | | nanolab/jml/showerhead/prD/PrD01, 110 cyc or 6:14 mins | ||
| S004691 | | S004691 | ||
! New showerhead | ! New showerhead | ||
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Latest revision as of 12:42, 6 February 2023
Unless otherwise stated, all content on this page was created by Jonas Michael-Lindhard, DTU Nanolab
| Date | Substrate Information | Process Information | SEM Images | ||||||
|---|---|---|---|---|---|---|---|---|---|
| Wafer info | Mask | Material/ Exposed area | Tool / Operator | Conditioning | Recipe | Wafer ID | Comments | ||
| 2/12-2014 | 4" Wafer with travka50 mask | AZ standard | Si / 50+ % | Pegasus/jmli | 10 minute TDESC clean | nanolab/jml/showerhead/prD/PrD01, 110 cyc or 6:14 mins | S004691 | New showerhead |
|
