Specific Process Knowledge/Etch/ICP Metal Etcher/silicon/nano/nanoetch/211nmzep: Difference between revisions

From LabAdviser
← Older edit
VisualWikitext
Jmli (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
4,416 edits
No edit summary
Jmli (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
4,416 edits
No edit summary
 
Line 2: Line 2:
<!--Checked for updates on 30/7-2018 - ok/jmli -->
<!--Checked for updates on 30/7-2018 - ok/jmli -->
<!--Checked for updates on 5/10-2020 - ok/jmli -->
<!--Checked for updates on 5/10-2020 - ok/jmli -->
{{Template:Author-jmli1}}
<!--Checked for updates on 2/02-2023 - ok/jmli -->


<gallery caption="The profiles of the 340 nm zep resist" widths="250" heights="200" perrow="3">
<gallery caption="The profiles of the 340 nm zep resist" widths="250" heights="200" perrow="3">

Latest revision as of 15:18, 2 February 2023

Feedback to this page: click here Unless otherwise stated, all content on this page was created by Jonas Michael-Lindhard, DTU Nanolab

  • The profiles of the 340 nm zep resist
  • The 30 nm zep profile
    The 30 nm zep profile
  • The 60 nm zep profile
    The 60 nm zep profile
  • The 90 nm zep profile
    The 90 nm zep profile
  • The 120 nm zep profile
    The 120 nm zep profile
  • The 150 nm zep profile
    The 150 nm zep profile
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Etch/ICP_Metal_Etcher/silicon/nano/nanoetch/211nmzep&oldid=44048"