Specific Process Knowledge/Etch/ICP Metal Etcher/Aluminium: Difference between revisions
No edit summary |
|||
| (One intermediate revision by the same user not shown) | |||
| Line 4: | Line 4: | ||
=== Aluminium etch === | === Aluminium etch === | ||
{{Template:Author-jmli1}} | |||
<!--Checked for updates on 2/02-2023 - ok/jmli --> | |||
The aluminium etch has two steps: | The aluminium etch has two steps: | ||
| Line 114: | Line 116: | ||
|~282 nm/min (depending on features size and etch load) | |~282 nm/min (depending on features size and etch load) | ||
|} | |} | ||
Latest revision as of 15:11, 2 February 2023
Feedback to this page: click here
Aluminium etch
Unless otherwise stated, all content on this page was created by Jonas Michael-Lindhard, DTU Nanolab
The aluminium etch has two steps:
- Breakthrough
- The breakthrough step is designed to break through the native aluminium oxide layer that is present on all aluminium surfaces. The duration of this step should remain fixed.
- Main
- The main step etches bulk aluminium.
| Parameter | Process step | |
|---|---|---|
| Breakthrough | Main | |
| Time (secs) | 20 | 40 (variable) |
| HBr (sccm) | - | 15 |
| Cl2 (sccm) | 20 | 25 |
| Pressure (mTorr) | 2, Strike 3 sec@5 mTorr | 1 |
| Coil power (W) | 600 | 500 |
| Platen power (W) | 125 | 100 |
| Temperature (oC) | 20 | 20 |
| Spacers (mm) | 30 | 30 |
| Results | ||
| Etch rate | ~350 nm/min (depending on features size and etch load) | |
| Parameter | Process step | |
|---|---|---|
| Breakthrough | Main | |
| Time (secs) | 20 | 40 (variable) |
| HBr (sccm) | - | 15 |
| Cl2 (sccm) | 20 | 25 |
| Pressure (mTorr) | 2, Strike 3 secs @ 6 mTorr | 1 |
| Coil power (W) | 600 | 500 |
| Platen power (W) | 125 | 100 |
| Temperature (oC) | 20 | 20 |
| Spacers (mm) | 100 | 100 |
| Results | ||
| Etch rate | ~282 nm/min (depending on features size and etch load) | |