Specific Process Knowledge/Etch/ICP Metal Etcher/silicon/nano/nanoetch/180nmzep: Difference between revisions

From LabAdviser
Jml (talk | contribs)
Created page with "<gallery caption="The profiles of the 180 nm zep resist" widths="250" heights="200" perrow="3"> image:WF_2B1_feb06_2011-030.jpg|The 30 nm zep profile image:WF_2B1_feb06_2011-0..."
 
Jmli (talk | contribs)
No edit summary
 
(4 intermediate revisions by the same user not shown)
Line 1: Line 1:
'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Etch/ICP_Metal_Etcher/silicon/nano/nanoetch/180nmzep click here]'''
<!--Checked for updates on 30/7-2018 - ok/jmli -->
<!--Checked for updates on 5/10-2020 - ok/jmli -->
{{Template:Author-jmli1}}
<!--Checked for updates on 2/02-2023 - ok/jmli -->
<gallery caption="The profiles of the 180 nm zep resist" widths="250" heights="200" perrow="3">
<gallery caption="The profiles of the 180 nm zep resist" widths="250" heights="200" perrow="3">
image:WF_2B1_feb06_2011-030.jpg|The 30 nm zep profile
image:WF_2B1_feb06_2011-030.jpg|The 30 nm zep profile

Latest revision as of 15:05, 2 February 2023

Feedback to this page: click here Unless otherwise stated, all content on this page was created by Jonas Michael-Lindhard, DTU Nanolab