Specific Process Knowledge/Thin film deposition/Deposition of Tungsten/Evaporation of W in Temescal: Difference between revisions
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=Deposition of W in Temescal= | =Deposition of W in Temescal= | ||
This page describes deposition of W in [[ | This page describes deposition of W in [[Specific_Process_Knowledge/Thin_film_deposition/Temescal|Temescal]]. | ||
During the e-beam deposition of Tungsten, extremely bright light and heat are generated! Lower density film than expected due to porosity. Consider using sputtering instead. | During the e-beam deposition of Tungsten, extremely bright light and heat are generated! Lower density film than expected due to porosity. Consider using sputtering instead. |
Revision as of 16:16, 2 January 2023
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Deposition of W in Temescal
This page describes deposition of W in Temescal.
During the e-beam deposition of Tungsten, extremely bright light and heat are generated! Lower density film than expected due to porosity. Consider using sputtering instead.
Power 33W, stable rate, tooling 86%. Measured thickness 20 nm (XRR).
Wait for base pressure 3 10-7Torr before start.
Deposition of Tungsten. Dep. rate: 0.5Å/s, Thickness sp.: 20nm | |||||||||||||||||||||||||||||||||||||||||||
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X-ray reflectivity. Measurement and Fit. Tooling 86%. Seems that this deposition suffered from a high oxidation level. (low fitted density of the main Ta layer) or poures formation