Specific Process Knowledge/Thin film deposition/Deposition of Carbon: Difference between revisions

From LabAdviser
← Older editNewer edit →
VisualWikitext
Eves (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
3,771 edits
No edit summary
Eves (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
3,771 edits
No edit summary
Line 1: Line 1:
center><span style="background:PaleGreen">3rd Level - Material/Method</span></center>
'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Thin_film_deposition/Deposition of Carbon&action=edit click here]'''  
'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/Deposition of Carbon click here]'''


== Deposition of Carbon ==
== Deposition of Carbon ==

Revision as of 20:10, 20 December 2022

Feedback to this page: of Carbon&action=edit click here

Deposition of Carbon

Carbon can be deposited by DC-sputtering method. So far the process has been tested only using Sputter-System (Lesker):

Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_Carbon&oldid=42048"