|
|
| (2 intermediate revisions by the same user not shown) |
| Line 1: |
Line 1: |
| {| border="2" cellpadding="0" cellspacing="0" style="text-align:center;"
| | |
| |-
| |
| ! rowspan="2" width="40"| Date
| |
| ! colspan="2" width="120"| Substrate Information
| |
| ! colspan="4" | Process Information
| |
| ! colspan="3" width="200" | Results
| |
| |-
| |
| ! width="30" | Wafer info
| |
| ! width="40" | Material/ Exposed area
| |
| ! width="40" | Condi- tioning
| |
| ! width="40" | Recipe
| |
| ! width="40" | Wafer ID
| |
| ! width="40" | Comments
| |
| ! width="400" |SEM images
| |
| ! width="100" |Picoscope
| |
| ! width="600" |Numbers
| |
| |-
| |
| |16/6-2021
| |
| |PegReticle wafer
| |
| |Si / 25-50%
| |
| |C06692.03 pegreticle wafer
| |
| |nanolab/ jmli / DREM / DREM 0.5kW v2.3, 50 cycles or 4:35 minutes
| |
| |C06694.01
| |
| |[http://labmanager.dtu.dk/function.php?module=Processlog&view=editlog&usageid=388881 Process log entry]
| |
| |
| |
| [[file:C06694.01c153.png |120px|frameless ]]
| |
| [[file:C06694.01c154.png |120px|frameless ]]
| |
| [[file:C06694.01c155.png |120px|frameless ]]
| |
| [[file:C06694.01c156.png |120px|frameless ]]
| |
| [[file:C06694.01c157.png |120px|frameless ]]
| |
| [[file:C06694.01c158.png |120px|frameless ]]
| |
| | <!-- Add picos here:[[file:S014009 1.gif |120px|frameless ]] -->
| |
| |
| |
| {| {{table}}
| |
| | align="center" style="background:#f0f0f0;"|'''SEM image:'''
| |
| | align="center" style="background:#f0f0f0;"|'''[http://labadviser.nanolab.dtu.dk/index.php/File:C06694.01c155.png c155]'''
| |
| | align="center" style="background:#f0f0f0;"|'''[http://labadviser.nanolab.dtu.dk/index.php/File:C06694.01c157.png c157]'''
| |
| | align="center" style="background:#f0f0f0;"|'''[http://labadviser.nanolab.dtu.dk/index.php/File:C06694.01c153.png c153]'''
| |
| |-
| |
| | Trench width (um)||0.21||0.79||0.84
| |
| |-
| |
| | Etched depth (um)||1.08||1.27||1.41
| |
| |-
| |
| | Etch rate (um/min)||0.24||0.28||0.31
| |
| |-
| |
| | <span title="The cycles will vary if the aspect ratio is large "> Etch rate (nm/cyc) </span>||21.61||25.46||28.14
| |
| |-
| |
| | Sidewall bowing (%)||0||1||0
| |
| |-
| |
| | Sidewall angle (degs)||90.31||90.19||90.3
| |
| |-
| |
| | Bottom bowing (%)||40.66||22.98||21.46
| |
| |-
| |
| |Aspect ratio||5.04||1.6||1.67
| |
| |-
| |
| |}
| |
| |-
| |
| |16/6-2021
| |
| |Morten Foss wafer
| |
| |Si / 10%
| |
| |C06695.14
| |
| |nanolab/ vy / DREM / DREM 0.5 kW v2.3 75 cyc or 6:52.5 mins
| |
| |C06694.01
| |
| |[http://labmanager.dtu.dk/function.php?module=Processlog&view=editlog&usageid=388881 Process log entry]
| |
| |
| |
| [[file:C06695.14c159.png |120px|frameless ]]
| |
| [[file:C06695.14c160.png |120px|frameless ]]
| |
| [[file:C06695.14c161.png |120px|frameless ]]
| |
| [[file:C06695.14c162.png |120px|frameless ]]
| |
| [[file:C06695.14c163.png |120px|frameless ]]
| |
| | <!-- Add picoscope links here:[[file:C06694.14 |120px|frameless ]] -->
| |
| |
| |
| {| {{table}}
| |
| | align="center" style="background:#f0f0f0;"|'''SEM image:'''
| |
| |-
| |
| | Trench width (um)
| |
| |-
| |
| | Etched depth (um)
| |
| |-
| |
| | Etch rate (um/min)
| |
| |-
| |
| | <span title="The cycles will vary if the aspect ratio is large "> Etch rate (nm/cyc) </span>
| |
| |-
| |
| | Sidewall bowing (%)
| |
| |-
| |
| | Sidewall angle (degs)
| |
| |-
| |
| | Bottom bowing (%)
| |
| |-
| |
| |Aspect ratio
| |
| |-
| |
| |}
| |
| |-
| |
| |27/9-2021
| |
| |DUV litho wafer,
| |
| |Si / 25-50%
| |
| |C06873.01
| |
| |nanolab/ jmli / DREM / DREM 0.5kW peg3, 100 cycles or 9:10 minutes
| |
| |C06873.02
| |
| |30 sec O2 0.2kW barc[http://labmanager.dtu.dk/function.php?module=Processlog&view=editlog&usageid=397212 Process log entry]
| |
| |
| |
| [[file:C06873.02c156.png |120px|frameless ]]
| |
| [[file:C06873.02c157.png |120px|frameless ]]
| |
| [[file:C06873.02c158.png |120px|frameless ]]
| |
| [[file:C06873.02c159.png |120px|frameless ]]
| |
| [[file:C06873.02c160.png |120px|frameless ]]
| |
| [[file:C06873.02c161.png |120px|frameless ]]
| |
| [[file:C06873.02c162.png |120px|frameless ]]
| |
| [[file:C06873.02c163.png |120px|frameless ]]
| |
| | <!-- Add picoscope links here:[[file:C06873.02 |120px|frameless ]] -->
| |
| |
| |
| {| {{table}}
| |
| | align="center" style="background:#f0f0f0;"|'''SEM image:'''
| |
| | align="center" style="background:#f0f0f0;"|'''[http://labadviser.nanolab.dtu.dk/index.php/File:C06873.02c157.png c157]'''
| |
| | align="center" style="background:#f0f0f0;"|'''[http://labadviser.nanolab.dtu.dk/index.php/File:C06873.02c158.png c158]'''
| |
| | align="center" style="background:#f0f0f0;"|'''[http://labadviser.nanolab.dtu.dk/index.php/File:C06873.02c159.png c159]'''
| |
| | align="center" style="background:#f0f0f0;"|'''[http://labadviser.nanolab.dtu.dk/index.php/File:C06873.02c161.png c161]'''
| |
| | align="center" style="background:#f0f0f0;"|'''[http://labadviser.nanolab.dtu.dk/index.php/File:C06873.02c162.png c162]'''
| |
| | align="center" style="background:#f0f0f0;"|'''[http://labadviser.nanolab.dtu.dk/index.php/File:C06873.02c160.png c160]'''
| |
| | align="center" style="background:#f0f0f0;"|'''[http://labadviser.nanolab.dtu.dk/index.php/File:C06873.02c156.png c156]'''
| |
| | align="center" style="background:#f0f0f0;"|'''[http://labadviser.nanolab.dtu.dk/index.php/File:C06873.02c163.png c163]'''
| |
| |-
| |
| | Trench width (um)||0.17||0.22||0.25||0.42||0.43||0.52||0.55||2.03
| |
| |-
| |
| | Etched depth (um)||1.3||1.36||1.4||1.56||1.57||1.62||1.64||1.87
| |
| |-
| |
| | Etch rate (um/min)||0.14||0.15||0.15||0.17||0.17||0.18||0.18||0.2
| |
| |-
| |
| | <span title="The cycles will vary if the aspect ratio is large "> Etch rate (nm/cyc) </span>||13||14||14||16||16||16||16||19
| |
| |-
| |
| | Sidewall bowing (%)||0||0.2||0.2||0.3||0.4||0.1||-0.1||0.1
| |
| |-
| |
| | Sidewall angle (degs)||89.38||89.33||89.41||89.29||89.43||89.44||89.4||89.21
| |
| |-
| |
| | Bottom bowing (%)||34.34||24.69||27.76||23.55||22.1||20.81||23.56||11.77
| |
| |-
| |
| |Aspect ratio||8.11||6.63||5.94||3.85||3.77||3.22||3.1||0.93
| |
| |-
| |
| |}
| |
| |-
| |
| |}
| |
