Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-4/SiO2 Etch

SiO2 Etch

I am in the process of doing some development of a SiO2 etch. So far I have found this fairly good recipe. For now it is the standard SiO2 etch recipes but I might change the "Standard recipe" a a later time if I find a better one. You are welcome to contact me see more result. I will add them to Labadviser at a later time. /Berit Herstrøm bghe@dtu.dk (Nanolab)

• Recipe name: SiO2_res_10, Recipe no. 10: C06445_02 coil_2500W, platen:300W, He/C4F8= 17.5, C4F8/H2=1, Pressure:8.8mTorr, C4F8:25.6sccm, He:448.7sccm, H2:25.6sccm, 3:56 min
• 

  0.4µ/0.2µ
  Bad lithography

• 

  0.5/0.25µ
  Etch depth: 652 nm
  Resist left: 456 nm

• 

  1µ/0.5µ:
  Etch depth: 855 nm
  Resist left: 487 nm

• 

  2µ/1µ:
  Etch depth: 952 nm
  Resist left: 487 nm

• 

  4µ/2µ:
  Etch depth: 1106 nm
  Resist left: 487 nm

• 

  0.8µ/0.2µ
  Etch depth: 867 nm
  Resist left: 426 nm

• 

  1.0µ/0.25µ:
  Etch depth: 893 nm
  Resist left: 460 nm

• 

  4µ/1µ:
  Etch depth: 1033 nm
  Resist left: 473 nm