Specific Process Knowledge/Etch/DRIE-Pegasus/Isotropic: Difference between revisions
Jump to navigation
Jump to search
No edit summary |
No edit summary |
||
| Line 1: | Line 1: | ||
'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser. | '''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Etch/DRIE-Pegasus/nanoetch click here]''' | ||
<!--Checked for updates on 14/5-2018 - ok/jmli --> | <!--Checked for updates on 14/5-2018 - ok/jmli --> | ||
<!--Checked for updates on 2/10-2020 - ok/jmli --> | <!--Checked for updates on 2/10-2020 - ok/jmli --> | ||
Revision as of 15:16, 2 October 2020
Feedback to this page: click here
| Recipe | Step | Temperature | Pressure | C4F8 | SF6 | O2 | Ar | Coil | Platen | Runs | Key words |
|---|---|---|---|---|---|---|---|---|---|---|---|
| Mediumiso1 | - | 20 | 25 | 0 | 150 | 0 | 0 | 600 | 3 | 1 | Works great. Used extensively for Ph.D. thesis of Peter Emil Larsen |
| Isoslow7 | - | 10 | 10 | 0 | 80 | 0 | 0 | 150 | 3 | 1 | |
| - |