Specific Process Knowledge/Thin film deposition/DiamondCVD: Difference between revisions

From LabAdviser
Jump to navigation Jump to search
No edit summary
(→‎SEKI Diamond CVD: added photo)
Line 4: Line 4:


== SEKI Diamond CVD ==
== SEKI Diamond CVD ==
The SEKI AX5250S is Microwave Plasma Chemical Vapor Deposition (MPCVD) chamber for growth of diamond thin films.  The system is fitted with gasses for diamond growth, which is hydrogen, methane, and oxygen. Depending on your starting material both polycrystalline and single crystalline diamond can be grown. Diamond has a lattice constant of 3.567 Å, which is not easily match to other materials, and therefore in general diamond growth must be seeded by diamond as nucleation sides. For single crystalline diamond this means that diamond layers in most cases must be grown on top of single crystal diamonds. For polycrystalline diamond, almost any material (which can handle 800 °C) will do. It just needs to be seeded with nano diamonds. The seeding can happen by immersion into solution, by polishing, or by spray coating with nano diamonds.
[[File:diamond cvd seki.png|400px|right|thumb|The SEKI diamond CVD in cleanroom B-1]]
<!--[[:File:diamond cvd seki.png]]-->
The SEKI AX5250S is a Microwave Plasma Chemical Vapor Deposition (MPCVD) system for growth of diamond thin films.  The system is fitted with gases for diamond growth, which are hydrogen, methane, and oxygen. Depending on the starting material both polycrystalline and single crystalline diamond can be grown. Diamond has a lattice constant of 3.567 Å, which is not easily matched to other materials, and therefore in general diamond growth must be seeded by diamond as nucleation sites. For single crystalline diamond this means that diamond layers in most cases must be grown on top of single crystal diamonds. For polycrystalline diamond, almost any material (which can handle 800 °C) will do. It just needs to be seeded with nano diamonds. The seeding can happen by immersion into solution, by polishing, or by spray coating with nano diamonds.


'''The user manual(s), user APV(s), technical information, and contact information can be found in LabManager:'''  
'''The user manual, APV, technical information, and contact information can be found in LabManager:'''  


[http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=397  Diamond CVD in LabManager]
[http://labmanager.nanolab.dtu.dk/function.php?module=Machine&view=view&mach=397  Diamond CVD in LabManager]
 
<!--[[:File:diamond example.png]]-->
<!--[[:File:diamond growth.png]]-->


== Poly crystalline diamond growth ==
== Poly crystalline diamond growth ==

Revision as of 21:22, 4 August 2020

Feedback to this page: click here

THIS PAGE IS UNDER CONSTRUCTIONUnder construction.png

SEKI Diamond CVD

The SEKI diamond CVD in cleanroom B-1

The SEKI AX5250S is a Microwave Plasma Chemical Vapor Deposition (MPCVD) system for growth of diamond thin films. The system is fitted with gases for diamond growth, which are hydrogen, methane, and oxygen. Depending on the starting material both polycrystalline and single crystalline diamond can be grown. Diamond has a lattice constant of 3.567 Å, which is not easily matched to other materials, and therefore in general diamond growth must be seeded by diamond as nucleation sites. For single crystalline diamond this means that diamond layers in most cases must be grown on top of single crystal diamonds. For polycrystalline diamond, almost any material (which can handle 800 °C) will do. It just needs to be seeded with nano diamonds. The seeding can happen by immersion into solution, by polishing, or by spray coating with nano diamonds.

The user manual, APV, technical information, and contact information can be found in LabManager:

Diamond CVD in LabManager


Poly crystalline diamond growth

For polycrystalline growth, the substrate must be seeded with diamonds. This is commondly done by sonicating the substrate in a solution of water with nano diamonds in it. After sonication the substrate is rinsed in water and blow-dried.

Software for analysis

Equipment performance and process related parameters

Equipment SEKI AX5250S
Purpose Diamond growth
  • Single crystalline diamond
  • Poly crystalline diamond
Parameters

H2

1000 sccm

CH4

50 sccm

O2

20 sccm

Operating pressure

>200 Torr

Power

5000 W

Temperature

700-900 °C

Substrates Substrate size

up to 100 mm wafers, 50 mm prefered

Allowed materials

Ask