Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange/ProcessA: Difference between revisions
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| Line 19: | Line 19: | ||
|- | |- | ||
| 18/8-2014 | | 18/8-2014 | ||
| 4" | | 4" Nanolab QC Wafer | ||
| 1.5 µm AZ resist, daq2 mask | | 1.5 µm AZ resist, daq2 mask | ||
| Si / 10 % | | Si / 10 % | ||
| Pegasus/jmli | | Pegasus/jmli | ||
| 10 minute TDESC clean, 10 minute PR strip post process | | 10 minute TDESC clean, 10 minute PR strip post process | ||
| | | nanolab/QC/QCprocA, 55 cycles (11+44) or 10:05 minutes | ||
| S004257 | | S004257 | ||
! OLD showerhead | ! OLD showerhead | ||
| Line 37: | Line 37: | ||
|- | |- | ||
| 20/11-2014 | | 20/11-2014 | ||
| 4" | | 4" Nanolab QC Wafer | ||
| 1.5 µm AZ resist, daq2 mask | | 1.5 µm AZ resist, daq2 mask | ||
| Si / 10 % | | Si / 10 % | ||
| Pegasus/jmli | | Pegasus/jmli | ||
| 10 minute TDESC clean, 10 minute PR strip post process | | 10 minute TDESC clean, 10 minute PR strip post process | ||
| | | Nanolab/QC/QCprocA, 55 cycles (11+44) or 10:05 minutes | ||
| S004580 | | S004580 | ||
! OLD showerhead | ! OLD showerhead | ||
| Line 52: | Line 52: | ||
|- | |- | ||
| 1/12-2014 | | 1/12-2014 | ||
| 4" | | 4" Nanolab QC Wafer | ||
| 1.5 µm AZ resist, daq2 mask | | 1.5 µm AZ resist, daq2 mask | ||
| Si / 10 % | | Si / 10 % | ||
| Pegasus/jmli | | Pegasus/jmli | ||
| 10 minute TDESC clean, 10 minute PR strip post process | | 10 minute TDESC clean, 10 minute PR strip post process | ||
| | | Nanolab/QC/QCprocA, 55 cycles (11+44) or 10:05 minutes | ||
| S004671 | | S004671 | ||
! New showerhead | ! New showerhead | ||
| Line 68: | Line 68: | ||
|- | |- | ||
| 15/12-2014 | | 15/12-2014 | ||
| 4" | | 4" Nanolab QC Wafer | ||
| 1.5 µm AZ resist, daq2 mask | | 1.5 µm AZ resist, daq2 mask | ||
| Si / 10 % | | Si / 10 % | ||
| Pegasus/jmli | | Pegasus/jmli | ||
| 10 minute TDESC clean, 10 minute PR strip post process | | 10 minute TDESC clean, 10 minute PR strip post process | ||
| | | Nanolab/QC/QCprocA, 55 cycles (11+44) or 10:05 minutes | ||
| S004746 | | S004746 | ||
! New showerhead | ! New showerhead | ||
Revision as of 22:20, 25 November 2019
| Date | Substrate Information | Process Information | SEM Images | ||||||
|---|---|---|---|---|---|---|---|---|---|
| Wafer info | Mask | Material/ Exposed area | Tool / Operator | Conditioning | Recipe | Wafer ID | Comments | ||
| 18/8-2014 | 4" Nanolab QC Wafer | 1.5 µm AZ resist, daq2 mask | Si / 10 % | Pegasus/jmli | 10 minute TDESC clean, 10 minute PR strip post process | nanolab/QC/QCprocA, 55 cycles (11+44) or 10:05 minutes | S004257 | OLD showerhead |
|
| 20/11-2014 | 4" Nanolab QC Wafer | 1.5 µm AZ resist, daq2 mask | Si / 10 % | Pegasus/jmli | 10 minute TDESC clean, 10 minute PR strip post process | Nanolab/QC/QCprocA, 55 cycles (11+44) or 10:05 minutes | S004580 | OLD showerhead |
|
| 1/12-2014 | 4" Nanolab QC Wafer | 1.5 µm AZ resist, daq2 mask | Si / 10 % | Pegasus/jmli | 10 minute TDESC clean, 10 minute PR strip post process | Nanolab/QC/QCprocA, 55 cycles (11+44) or 10:05 minutes | S004671 | New showerhead |
|
| 15/12-2014 | 4" Nanolab QC Wafer | 1.5 µm AZ resist, daq2 mask | Si / 10 % | Pegasus/jmli | 10 minute TDESC clean, 10 minute PR strip post process | Nanolab/QC/QCprocA, 55 cycles (11+44) or 10:05 minutes | S004746 | New showerhead |
|
