Specific Process Knowledge/Lithography/ZEP520A: Difference between revisions

Latest revision as of 20:34, 25 November 2019

This is a standard positive resist from ZEON. The resist is very expensive; DTU Nanolab has thus stopped buying this resist. Use CSAR instead.

Contact lithography@nanolab.dtu.dk if you wish to use this resist.

Spin Curves

The thickness is measured on VASE Ellipsometer using a simple Cauchy model for a transparent polymer on a Si wafer with native oxide. The measurements are performed at one incidence angle (70 degrees) only. 9 points on each 4" wafer has been measured; the standard deviation thus represents the homogeinity of the film on the 4" wafers.

ZEON ZEP520A1:1 in anisole spinning on Spin Coater: Manual LabSpin A-5, TIGRE, 23-04-2014. Resist was mixed 13-01-2014, i.e. approximately 3 months old.
Spin Speed [rpm]	Acceleration [1/s2]	Thickness [nm]	St Dev
3000	4000	111.29	0.65
4000	4000	95.17	2.16
5000	4000	87.23	0.81

ZEON ZEP520A1:1 in anisole spinning on Spin Coater: Manual LabSpin A-5, TIGRE, 21-05-2014. Resist was mixed 15-05-2014, i.e. approximately 6 days old.
Spin Speed [rpm]	Acceleration [1/s2]	Thickness [nm]	St Dev
2000	4000	141.03	1.02
3000	4000	115.96	0.98
4000	4000	100.56	0.80
5000	4000	91.01	0.38
6000	4000	84.85	0.37

ZEON ZEP520A1:2 in anisole spinning on Spin Coater: Manual LabSpin A-5, TIGRE, 21-05-2014. Resist was mixed 15-05-2014, i.e. approximately 6 days old.
Spin Speed [rpm]	Acceleration [1/s2]	Thickness [nm]	St Dev
2000	4000	79.12	1.74
3000	4000	64.30	0.34
4000	4000	55.50	0.48
5000	4000	50.53	0.62
6000	4000	46.34	1.01

@@ Line 1: / Line 1: @@
-These tests are currently in progress and this page thus under construction. If you have questions to the process or wish to use this e-beam resist, please contact Tine Greibe at tigre@danchip.dtu.dk.
-== Process Flow ==
+This is a standard positive resist from ZEON. The resist is very expensive; DTU Nanolab has thus stopped buying this resist.
-Test of ZEP resist; a positive e-beam resist from ZEON.
+Use CSAR instead.
+Contact lithography@nanolab.dtu.dk if you wish to use this resist.
-{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;" style="width: 60%;"
-|-
-|-
-|-style="background:Black; color:White"
-!Equipment
-!Process Parameters
-!Comments
-!Initials and date
-|-
-|-
-|-style="background:WhiteSmoke; color:black; text-align:center"
-!colspan="4"|Pretreatment
-|-
-|-
-|-style="background:LightGrey; color:black"
-|4" Si wafers
-|No Pretreatment
-|
-|TIGRE, 23-04-2014
-|-
-|-
-|-style="background:WhiteSmoke; color:black; text-align:center"
-!colspan="4"|Spin Coat
-|-
-|-
-|-style="background:LightGrey; color:black"
-|Spin Coater Manual, LabSpin, A-5
-|ZEP520A 1:1 or ZEP520A 1:2 E-beam resist
-sec at various spin speed.
-Acceleration 4000 s-2,
-softbake 2 min at 180 deg Celcius
-|Resist poured directly from bottle or disposable pipette
-|TIGRE, 23-04-2014 and 21-05-2014
-|-
-|-
-|-style="background:WhiteSmoke; color:black; text-align:center"
-!colspan="4"|Characterization
-|-
-|-
-|-style="background:LightGrey; color:black"
-|Ellipsometer VASE B-1
-|9 points measured on 100 mm wafer
-|ZEP program used; measured at 70 deg only
-|TIGRE, 23-04-2014 and 21-05-2014
-|-
-|-
-|-style="background:WhiteSmoke; color:black; text-align:center"
-!colspan="4"|E-beam Exposure
-|-
-|-
-|-style="background:LightGrey; color:black"
-|JEOL 9500 E-beam writer, E-1
-|Dosepattern 14nm - 100nm,
-dose 120-280 muC/cm2
-|Virtual chip mark height detection
-| TIGRE
-|-
-|-
-|-style="background:WhiteSmoke; color:black; text-align:center"
-!colspan="4"|Development
-|-
-|-
-|-style="background:LightGrey; color:black"
-|Fumehood, D-3
-|60 sec in N50,
-sec rinse in IPA,
-N2 Blow dry
-|Agitation (by hand) while developing
-| TIGRE, XX-04-2014
-|-
-|-
-|-style="background:WhiteSmoke; color:black; text-align:center"
-!colspan="4"|Characterization
-|-
-|-
-|-style="background:LightGrey; color:black"
-|Zeiss SEM Supra 60VP, D-3
-|
-|
-| TIGRE, ??-04-2014
-|-
-|}
-=== Disposable pippettes ===
-blah
 == Spin Curves ==
@@ Line 115: / Line 12: @@
-The thickness is measured on VASE Ellipsometer using a simple Cauchy model for a transparent polymer on a Si wafer with native oxide. The measurements are performed at one incidence angle (70 degrees) only. 9 points on each 4" wafer has been measured; the standard deviation thus representing the homogeinity of the film on the 4" wafers.
+The thickness is measured on VASE Ellipsometer using a simple Cauchy model for a transparent polymer on a Si wafer with native oxide. The measurements are performed at one incidence angle (70 degrees) only. 9 points on each 4" wafer has been measured; the standard deviation thus represents the homogeinity of the film on the 4" wafers.
 {|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"  style="width: 40%"
@@ Line 122: / Line 19: @@
 |-
 |-style="background:Black; color:White"
-!colspan="7"|ZEON ZEP520A1:1 in anisole spinning on Spin Coater: Manual LabSpin A-5, TIGRE, 23-04-2014. Resist was mixed 13-01-2014, i.e. approximatley 3 months old.
+!colspan="7"|ZEON ZEP520A1:1 in anisole spinning on Spin Coater: Manual LabSpin A-5, TIGRE, 23-04-2014. Resist was mixed 13-01-2014, i.e. approximately 3 months old.
 |-
@@ Line 167: / Line 64: @@
 |-
 |-style="background:red; color:White"
-!colspan="7"|ZEON ZEP520A1:1 in anisole spinning on Spin Coater: Manual LabSpin A-5, TIGRE, 21-05-2014. Resist was mixed 15-05-2014, i.e. approximatley 6 days old.
+!colspan="7"|ZEON ZEP520A1:1 in anisole spinning on Spin Coater: Manual LabSpin A-5, TIGRE, 21-05-2014. Resist was mixed 15-05-2014, i.e. approximately 6 days old.
 |-
@@ Line 227: / Line 124: @@
 |-
 |-style="background:green; color:White"
-!colspan="7"|ZEON ZEP520A1:2 in anisole spinning on Spin Coater: Manual LabSpin A-5, TIGRE, 21-05-2014. Resist was mixed 15-05-2014, i.e. approximatley 6 days old.
+!colspan="7"|ZEON ZEP520A1:2 in anisole spinning on Spin Coater: Manual LabSpin A-5, TIGRE, 21-05-2014. Resist was mixed 15-05-2014, i.e. approximately 6 days old.
 |-