Specific Process Knowledge/Thin film deposition/DiamondCVD

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SEKI Diamond CVD

The SEKI AX5250S is Microwave Plasma Chemical Vapor Deposition (MPCVD) chamber for growth of diamond thin films. The system is fitted with gasses for diamond growth, which is hydrogen, methane, and oxygen. Depending on your starting material both polycrystalline and single crystalline diamond can be grown. Diamond has a lattice constant of 3.567 Å, which is not easily match to other materials, and therefore in general diamond growth must be seeded by diamond as nucleation sides. For single crystalline diamond this means that diamond layers in most cases must be grown on top of single crystal diamonds. For polycrystalline diamond, almost any material (which can handle 800 °C) will do. It just needs to be seeded with nano diamonds. The seeding can happen by immersion into solution, by polishing, or by spray coating with nano diamonds.

The user manual(s), user APV(s), technical information, and contact information can be found in LabManager:

Diamond CVD in LabManager

Poly crystalline diamond growth

For polycrystalline growth, the substrate must be seeded with diamonds. This is commondly done by sonicating the substrate in a solution of water with nano diamonds in it. After sonication the substrate is rinsed in water and blow-dried.

Equipment performance and process related parameters

Equipment		SEKI AX5250S
Purpose	Diamond growth	Single crystalline diamond Poly crystalline diamond
Parameters	H2	1000 sccm
	CH4	50 sccm
	O2	20 sccm
	Operating pressure	>200 Torr
	Power	5000 W
	Temperature	700-900 °C
Substrates	Substrate size	up to 100 mm wafers, 50 mm prefered
	Allowed materials	Ask