Specific Process Knowledge/Thin film deposition/DiamondCVD: Difference between revisions
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'''The user manual(s), user APV(s), technical information, and contact information can be found in LabManager:''' | '''The user manual(s), user APV(s), technical information, and contact information can be found in LabManager:''' | ||
[http://labmanager.dtu.dk/function.php?module=Machine&view=view& | [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=397 Diamond CVD in LabManager] | ||
== Process information == | == Process information == | ||
Revision as of 12:14, 30 November 2018
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SEKI Diamond CVD
The user manual(s), user APV(s), technical information, and contact information can be found in LabManager:
Process information
Software for analysis
| Equipment | SEKI AX5250S | |
|---|---|---|
| Purpose | Diamond growth |
|
| Parameters |
H2 |
1000 sccm |
|
CH4 |
50 sccm | |
|
O2 |
20 sccm | |
|
Operating pressure |
>200 Torr | |
|
Power |
5000 W | |
|
Temperature |
700-900 °C | |
| Substrates | Substrate size |
up to 100 mm wafers, 50 mm prefered |
| Allowed materials |
Ask | |