Specific Process Knowledge/Characterization: Difference between revisions

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|  width="50" align="center" style="background:#f0f0f0;"|'''[[Specific Process Knowledge/Characterization/AFM: Atomic Force Microscopy|AFM]]'''
|  width="50" align="center" style="background:#f0f0f0;"|'''[[Specific Process Knowledge/Characterization/AFM: Atomic Force Microscopy|AFM]]'''
|  width="50" align="center" style="background:#f0f0f0;"|'''[[Specific Process Knowledge/Characterization/Profiler|Stylus profiler]]'''
|  width="50" align="center" style="background:#f0f0f0;"|'''[[Specific Process Knowledge/Characterization/Profiler|Stylus profiler]]'''
|  width="50" align="center" style="background:#f0f0f0;"|'''Optical profiler'''
|  width="50" align="center" style="background:#f0f0f0;"|'''[[Specific_Process_Knowledge/Characterization/Profiler#Optical_Profiler|Optical profiler]]'''
|  width="50" align="center" style="background:#f0f0f0;"|'''Filmtek (reflec- tometer)'''
|  width="50" align="center" style="background:#f0f0f0;"|'''Filmtek (reflec- tometer)'''
|  width="50" align="center" style="background:#f0f0f0;"|'''Ellip- someter'''
|  width="50" align="center" style="background:#f0f0f0;"|'''Ellip- someter'''

Revision as of 14:43, 26 October 2018

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Overview of characteristics and where to measure it

Optical Micro- scopes SEM (incl. EDX) AFM Stylus profiler Optical profiler Filmtek (reflec- tometer) Ellip- someter Thickness stylus XPS PL mapper 4-point probe Probe station XRD Life time scanner Drop shape analyser Hardness tester Differential Scanning Calorimeter DSC Surfscan IR-camera
Breakdown voltage
Charge carrier life time x
Contact angle hydrophobic/hydrophillic x
Crystallinity x x
Deposition uniformity x x x
Dimensions(in plane) x x (x) (x) x
Dimensions(height) (x) (x) x x x
Electrical conductivity x
Element analysis x x x 4) x 4)
Film stress x x
Imaging x x x x
Material Hardness x
Optical gap x x
Particles x x x x
Phase changes x
Reflectivity x x x 6)
Refractive index x x
Resistivity x
Step coverage x 1) x 1)
Surface roughness x x x
Thermal conductivity
Thin film thickness x 1) x 1) x 2) x 2) x x x x 5) x 3) x
Voids in wafer bonding x x x
Wafer thickness x 1) x 1) x
  1. Using the cross section method
  2. Using the create step method
  3. With known resistivity
  4. Composition information for crystalline materials
  5. Only single layer
  6. Good for characterization of VCSEL structures and DBR mirrors

Choose characterization topic

Choose equipment

AFM

Element analysis

Optical and stylus profilers

Optical microscopes

Optical characterization

SEMs at CEN

SEMs at Danchip

TEMs at CEN

Electrical measurements

Various