Specific Process Knowledge/Characterization/XRD: Difference between revisions
| Line 45: | Line 45: | ||
*Density | *Density | ||
|- | |- | ||
!style="background:silver; color:black" align="center" valign="center" rowspan="2"| | !style="background:silver; color:black" align="center" valign="center" rowspan="2"|X-ray generator | ||
|style="background:LightGrey; color:black"| | |style="background:LightGrey; color:black"| | ||
Maximum rated output | |||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
3 kW | |||
|- | |- | ||
|style="background:LightGrey; color:black"| | |style="background:LightGrey; color:black"| | ||
Rated tube voltage | |||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
20 to 45 kV | |||
|- | |||
|style="background:LightGrey; color:black"| | |||
Rated tube current | |||
|style="background:WhiteSmoke; color:black"| | |||
2 to 60 mA | |||
|- | |||
|style="background:LightGrey; color:black"| | |||
Type | |||
|style="background:WhiteSmoke; color:black"| | |||
Sealed tube | |||
|- | |||
|style="background:LightGrey; color:black"| | |||
Target | |||
|style="background:WhiteSmoke; color:black"| | |||
Cu | |||
|- | |||
|style="background:LightGrey; color:black"| | |||
Focus size | |||
|style="background:WhiteSmoke; color:black"| | |||
0.4x8 mm (Line/Point) | |||
|- | |- | ||
!style="background:silver; color:black" align="center" valign="center" rowspan="2"|Process parameter range | !style="background:silver; color:black" align="center" valign="center" rowspan="2"|Process parameter range | ||
| Line 73: | Line 92: | ||
| style="background:LightGrey; color:black"|Allowed materials | | style="background:LightGrey; color:black"|Allowed materials | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
All materials | |||
|- | |- | ||
|} | |} | ||
<br clear="all" /> | <br clear="all" /> | ||
Revision as of 10:44, 10 July 2018
Feedback to this page: click here
XRD SmartLab
The Rigaku SmartLab is an advanced XRD for measuring on thin films. All thin films can be measured without fixating the sample, as the system has a so called In-Plane arm.
The user manual(s), user APV(s), technical information, and contact information can be found in LabManager:
Process information
Software for analysis
The software packages used for data analysis are available on the equipment computer, but we recommend that you install it on your personal computer. To run the software you need a USB dongle with a license on, these can be borrowed from Rebecca and Kristian in room 347-077. We only have 9 dongles available, so when you are done please return the dongle to danchip.
The software can be found on "CleanroomDrive\_Equipment\XRD\Rigaku software\RILauncher", it should be possible to install the software without a dongle. To use the software you have to log in. The user is: Administrator. There is no password.
| Equipment | XRD SmartLab | |
|---|---|---|
| Purpose | Crystal structure analysis and thin film thickness measurement |
|
| X-ray generator |
Maximum rated output |
3 kW |
|
Rated tube voltage |
20 to 45 kV | |
|
Rated tube current |
2 to 60 mA | |
|
Type |
Sealed tube | |
|
Target |
Cu | |
|
Focus size |
0.4x8 mm (Line/Point) | |
| Process parameter range | Parameter 1 |
|
| Parameter 2 |
| |
| Substrates | Batch size |
up to 150 mm wafers |
| Allowed materials |
All materials | |