File:E beam Cr 10Å s.ppt: Difference between revisions
AFM picture of Cr layer deposited with E-beam evaporation in Wordentec. Deposition rate 10 Å/s. |
uploaded a new version of "Image:E beam Cr 10Å s.ppt": AFM picture of e-beam deposited Cr layer, deposited with Wordentec. Rate 1 nm/s. |
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Latest revision as of 15:34, 12 August 2008
AFM picture of Cr layer deposited with E-beam evaporation in Wordentec. Deposition rate 10 Å/s.
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| Date/Time | Dimensions | User | Comment | |
|---|---|---|---|---|
| current | 15:34, 12 August 2008 | (174 KB) | Kn (talk | contribs) | AFM picture of e-beam deposited Cr layer, deposited with Wordentec. Rate 1 nm/s. |
| 15:29, 12 August 2008 | (174 KB) | Kn (talk | contribs) | AFM picture of Cr layer deposited with E-beam evaporation in Wordentec. Deposition rate 10 Å/s. |
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