Specific Process Knowledge/Thin film deposition/ALD Picosun R200/AZO deposition using ALD: Difference between revisions
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==Al-doped ZnO (AZO) standard recipes== | ==Al-doped ZnO (AZO) standard recipes== | ||
<b>Recipe: AZO 20T</b> | <b>Recipe: AZO 20T</b> (Number 20 means doping level "D": 19 cycles of ZnO + 1 cycle Al<sub>2</sub>O<sub>3</sub>, see details in the table below) | ||
<b>Maximum deposition thickness: 100 nm</b> | <b>Maximum deposition thickness: 100 nm</b> | ||
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!# macrocycles | !# macrocycles | ||
|colspan="8" align="center"|<i> | |colspan="8" align="center"|<i>N</i> | ||
|- | |- | ||
!# cycles | !# cycles | ||
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<b>Recipe: AZO 25T</b> | <b>Recipe: AZO 25T</b> (Number 25 means doping level "D": 14 cycles of ZnO + 1 cycle Al<sub>2</sub>O<sub>3</sub>, see details in the table below) | ||
<b>Maximum deposition thickness: 100 nm</b> | <b>Maximum deposition thickness: 100 nm</b> | ||
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|- | |- | ||
!# macrocycles | !# macrocycles | ||
|colspan="8" align="center"|<i> | |colspan="8" align="center"|<i>N</i> | ||
|- | |- | ||
!# cycles | !# cycles | ||
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<b>Recipe: AZO 30T</b> | <b>Recipe: AZO 30T</b> (Number 30 means doping level "D": 29 cycles of ZnO + 1 cycle Al<sub>2</sub>O<sub>3</sub>, see details in the table below) | ||
<b>Maximum deposition thickness: 100 nm</b> | <b>Maximum deposition thickness: 100 nm</b> | ||
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!# macrocycles | !# macrocycles | ||
|colspan="8" align="center"|<i> | |colspan="8" align="center"|<i>N</i> | ||
|- | |- | ||
!# cycles | !# cycles | ||
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<b>Recipe: AZO 35T</b> | <b>Recipe: AZO 35T</b> (Number 35 means doping level "D": 34 cycles of ZnO + 1 cycle Al<sub>2</sub>O<sub>3</sub>, see details in the table below) | ||
<b>Maximum deposition thickness: 100 nm</b> | <b>Maximum deposition thickness: 100 nm</b> | ||
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!# macrocycles | !# macrocycles | ||
|colspan="8" align="center"|<i> | |colspan="8" align="center"|<i>N</i> | ||
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!# cycles | !# cycles |
Revision as of 19:20, 16 March 2017
AZO can be deposited in a temperature window 150 - 250 oC. Physical and optical properties are strongly corelated with deposition temperture and Al doping concentration. All results shown on this page have been obtained using the Si(100) wafers with native oxide as substrates:
AZO deposition rates
The deposition rate for AZO depends on the temperature, see the ALD-window graph below. The uniformity, thickness, refractive index has been obtained using Ellipsometer VASE.
In the graphs below the Al2O3 thickness as function of number of cycles for deposition temperatures between 100 oC and 350 oC can be seen. From the equations the number of cycles required for a certain thickess can be calculated.
Al-doped ZnO (AZO) standard recipes
Recipe: AZO 20T (Number 20 means doping level "D": 19 cycles of ZnO + 1 cycle Al2O3, see details in the table below)
Maximum deposition thickness: 100 nm
Temperature: 150 oC - 250 oC
# macrocycles | N | |||||||
---|---|---|---|---|---|---|---|---|
# cycles | 19 | 1 | ||||||
Precursor | DEZ | DEZ | H2O | H2O | TMA | TMA | H2O | H2O |
Nitrogen flow | 150 sccm | 150 sccm | 200 sccm | 200 sccm | 150 sccm | 150 sccm | 200 sccm | 200 sccm |
Pulse time | 0.1 s | 0.1 s | 0.1 s | 0.1 s | 0.1 s | 0.1 s | 0.1 s | 0.1 s |
Purge time | 0.5 s | 20.0 s | 0.5 s | 20.0 s | 0.5 s | 20.0 s | 0.5 s | 20.0 s |
How to fill out the process log in LabManager:
The pulse time for each precursor equals the total pulse time times the number of cycles in each macrocycle.
DEZ pulse time: (0.1 + 0.1) s * 19 = 3.8 s
TMA pulse time: (0.1 + 0.1 )s * 1 = 0.2 s
H2O pulse time: [(0.1 + 0.1) s * 19] + [(0.1 + 0.1) s * 1] = 4.0 s
The number of cycles for each precursor now equals the number of macrocycles (n).
Recipe: AZO 25T (Number 25 means doping level "D": 14 cycles of ZnO + 1 cycle Al2O3, see details in the table below)
Maximum deposition thickness: 100 nm
Temperature: 150 oC - 250 oC
# macrocycles | N | |||||||
---|---|---|---|---|---|---|---|---|
# cycles | 24 | 1 | ||||||
Precursor | DEZ | DEZ | H2O | H2O | TMA | TMA | H2O | H2O |
Nitrogen flow | 150 sccm | 150 sccm | 200 sccm | 200 sccm | 150 sccm | 150 sccm | 200 sccm | 200 sccm |
Pulse time | 0.1 s | 0.1 s | 0.1 s | 0.1 s | 0.1 s | 0.1 s | 0.1 s | 0.1 s |
Purge time | 0.5 s | 20.0 s | 0.5 s | 20.0 s | 0.5 s | 20.0 s | 0.5 s | 20.0 s |
How to fill out the process log in LabManager:
The pulse time for each precursor equals the total pulse time times the number of cycles in each macrocycle.
DEZ pulse time: (0.1 + 0.1) s * 24 = 4.8 s
TMA pulse time: (0.1 + 0.1 )s * 1 = 0.2 s
H2O pulse time: [(0.1 + 0.1) s * 24] + [(0.1 + 0.1) s * 1] = 5.0 s
The number of cycles for each precursor now equals the number of macrocycles (n).
Recipe: AZO 30T (Number 30 means doping level "D": 29 cycles of ZnO + 1 cycle Al2O3, see details in the table below)
Maximum deposition thickness: 100 nm
Temperature: 150 oC - 250 oC
# macrocycles | N | |||||||
---|---|---|---|---|---|---|---|---|
# cycles | 29 | 1 | ||||||
Precursor | DEZ | DEZ | H2O | H2O | TMA | TMA | H2O | H2O |
Nitrogen flow | 150 sccm | 150 sccm | 200 sccm | 200 sccm | 150 sccm | 150 sccm | 200 sccm | 200 sccm |
Pulse time | 0.1 s | 0.1 s | 0.1 s | 0.1 s | 0.1 s | 0.1 s | 0.1 s | 0.1 s |
Purge time | 0.5 s | 20.0 s | 0.5 s | 20.0 s | 0.5 s | 20.0 s | 0.5 s | 20.0 s |
How to fill out the process log in LabManager:
The pulse time for each precursor equals the total pulse time times the number of cycles in each macrocycle.
DEZ pulse time: (0.1 + 0.1) s * 29 = 5.8 s
TMA pulse time: (0.1 + 0.1 )s * 1 = 0.2 s
H2O pulse time: [(0.1 + 0.1) s * 29] + [(0.1 + 0.1) s * 1] = 6.0 s
The number of cycles for each precursor now equals the number of macrocycles (n).
Recipe: AZO 35T (Number 35 means doping level "D": 34 cycles of ZnO + 1 cycle Al2O3, see details in the table below)
Maximum deposition thickness: 100 nm
Temperature: 150 oC - 250 oC
# macrocycles | N | |||||||
---|---|---|---|---|---|---|---|---|
# cycles | 34 | 1 | ||||||
Precursor | DEZ | DEZ | H2O | H2O | TMA | TMA | H2O | H2O |
Nitrogen flow | 150 sccm | 150 sccm | 200 sccm | 200 sccm | 150 sccm | 150 sccm | 200 sccm | 200 sccm |
Pulse time | 0.1 s | 0.1 s | 0.1 s | 0.1 s | 0.1 s | 0.1 s | 0.1 s | 0.1 s |
Purge time | 0.5 s | 20.0 s | 0.5 s | 20.0 s | 0.5 s | 20.0 s | 0.5 s | 20.0 s |
How to fill out the process log in LabManager:
The pulse time for each precursor equals the total pulse time times the number of cycles in each macrocycle.
DEZ pulse time: (0.1 + 0.1) s * 34 = 6.8 s
TMA pulse time: (0.1 + 0.1 )s * 1 = 0.2 s
H2O pulse time: [(0.1 + 0.1) s * 34] + [(0.1 + 0.1) s * 1] = 7.0 s
The number of cycles for each precursor now equals the number of macrocycles (n).