Specific Process Knowledge/Thin film deposition/ALD Picosun R200/AZO deposition using ALD: Difference between revisions

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<b>Recipe: AZO 20T</b>
<b>Recipe: AZO 20T</b>


<b>Maximum deposition thickness: xx nm</b>
<b>Maximum deposition thickness: 100 nm</b>


<b>Temperature: x <sup>o</sup>C - xx <sup>o</sup>C</b>
<b>Temperature: 150 <sup>o</sup>C - 250 <sup>o</sup>C</b>


{| border="2" cellspacing="2" cellpadding="9"  align="none"
{| border="2" cellspacing="2" cellpadding="9"  align="none"
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<b>How to fill out the process log in LabManager:</b>
<b>How to fill out the process log in LabManager:</b>


The pulse time for each precursor equals the total pulse time times the number of cycles in each macroscycle.
The pulse time for each precursor equals the total pulse time times the number of cycles in each macrocycle.


DEZ pulse time: (0.1 + 0.1) s * 20 = 4 s  
DEZ pulse time: (0.1 + 0.1) s * 20 = 4 s  
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<b>Recipe: AZO 25T</b>
<b>Recipe: AZO 25T</b>


<b>Maximum deposition thickness: xx nm</b>
<b>Maximum deposition thickness: 100 nm</b>


<b>Temperature: x <sup>o</sup>C - xx <sup>o</sup>C</b>
<b>Temperature: 150 <sup>o</sup>C - 250 <sup>o</sup>C</b>


{| border="2" cellspacing="2" cellpadding="9"  align="none"
{| border="2" cellspacing="2" cellpadding="9"  align="none"
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<b>How to fill out the process log in LabManager:</b>
<b>How to fill out the process log in LabManager:</b>


The pulse time for each precursor equals the total pulse time times the number of cycles in each macroscycle.
The pulse time for each precursor equals the total pulse time times the number of cycles in each macrocycle.


DEZ pulse time: (0.1 + 0.1) s * 25 = 5 s  
DEZ pulse time: (0.1 + 0.1) s * 25 = 5 s  
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<b>Recipe: AZO 30T</b>
<b>Recipe: AZO 30T</b>


<b>Maximum deposition thickness: xx nm</b>
<b>Maximum deposition thickness: 100 nm</b>


<b>Temperature: x <sup>o</sup>C - xx <sup>o</sup>C</b>
<b>Temperature: 150 <sup>o</sup>C - 250 <sup>o</sup>C</b>


{| border="2" cellspacing="2" cellpadding="9"  align="none"
{| border="2" cellspacing="2" cellpadding="9"  align="none"
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<b>Recipe: AZO 35T</b>
<b>Recipe: AZO 35T</b>


<b>Maximum deposition thickness: xx nm</b>
<b>Maximum deposition thickness: 100 nm</b>


<b>Temperature: x <sup>o</sup>C - xx <sup>o</sup>C</b>
<b>Temperature: 150 <sup>o</sup>C - 250 <sup>o</sup>C</b>


{| border="2" cellspacing="2" cellpadding="9"  align="none"
{| border="2" cellspacing="2" cellpadding="9"  align="none"

Revision as of 16:59, 16 March 2017

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Et2Zn or Zn(CH3CH2)2 = DEZ (diethylzinc)

Recipe: AZO 20T

Maximum deposition thickness: 100 nm

Temperature: 150 oC - 250 oC

# macrocycles n
# cycles 19 1
Precursor DEZ DEZ H2O H2O TMA TMA H2O H2O
Nitrogen flow 150 sccm 150 sccm 200 sccm 200 sccm 150 sccm 150 sccm 200 sccm 200 sccm
Pulse time 0.1 s 0.1 s 0.1 s 0.1 s 0.1 s 0.1 s 0.1 s 0.1 s
Purge time 0.5 s 20.0 s 0.5 s 20.0 s 0.5 s 20.0 s 0.5 s 20.0 s


How to fill out the process log in LabManager:

The pulse time for each precursor equals the total pulse time times the number of cycles in each macrocycle.

DEZ pulse time: (0.1 + 0.1) s * 20 = 4 s

TMA pulse time: (0.1 + 0.1 )s * 1 = 0.2 s

H2O pulse time: [(0.1 + 0.1) s * 20] + [(0.1 + 0.1) s * 1] = 4.2 s

The number of cycles for each precursor now equals the number of macrocycles (n).


Recipe: AZO 25T

Maximum deposition thickness: 100 nm

Temperature: 150 oC - 250 oC

# macrocycles n
# cycles 24 1
Precursor DEZ DEZ H2O H2O TMA TMA H2O H2O
Nitrogen flow 150 sccm 150 sccm 200 sccm 200 sccm 150 sccm 150 sccm 200 sccm 200 sccm
Pulse time 0.1 s 0.1 s 0.1 s 0.1 s 0.1 s 0.1 s 0.1 s 0.1 s
Purge time 0.5 s 20.0 s 0.5 s 20.0 s 0.5 s 20.0 s 0.5 s 20.0 s


How to fill out the process log in LabManager:

The pulse time for each precursor equals the total pulse time times the number of cycles in each macrocycle.

DEZ pulse time: (0.1 + 0.1) s * 25 = 5 s

TMA pulse time: (0.1 + 0.1 )s * 1 = 0.2 s

H2O pulse time: [(0.1 + 0.1) s * 20] + [(0.1 + 0.1) s * 1] = 5.2 s

The number of cycles for each precursor now equals the number of macrocycles (n).


Recipe: AZO 30T

Maximum deposition thickness: 100 nm

Temperature: 150 oC - 250 oC

# macrocycles n
# cycles 29 1
Precursor DEZ DEZ H2O H2O TMA TMA H2O H2O
Nitrogen flow 150 sccm 150 sccm 200 sccm 200 sccm 150 sccm 150 sccm 200 sccm 200 sccm
Pulse time 0.1 s 0.1 s 0.1 s 0.1 s 0.1 s 0.1 s 0.1 s 0.1 s
Purge time 0.5 s 20.0 s 0.5 s 20.0 s 0.5 s 20.0 s 0.5 s 20.0 s


Recipe: AZO 35T

Maximum deposition thickness: 100 nm

Temperature: 150 oC - 250 oC

# macrocycles n
# cycles 34 1
Precursor DEZ DEZ H2O H2O TMA TMA H2O H2O
Nitrogen flow 150 sccm 150 sccm 200 sccm 200 sccm 150 sccm 150 sccm 200 sccm 200 sccm
Pulse time 0.1 s 0.1 s 0.1 s 0.1 s 0.1 s 0.1 s 0.1 s 0.1 s
Purge time 0.5 s 20.0 s 0.5 s 20.0 s 0.5 s 20.0 s 0.5 s 20.0 s
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