Specific Process Knowledge/Thin film deposition/ALD Picosun R200/AZO deposition using ALD: Difference between revisions

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=<span style="background:#FF2800">THIS PAGE IS UNDER CONSTRUCTION</span>[[image:Under_construction.png|200px]]=
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Et<sub>2</sub>Zn or Zn(CH<sub>3</sub>CH<sub>2</sub>)<sub>2</sub>= DEZ
Et<sub>2</sub>Zn or Zn(CH<sub>3</sub>CH<sub>2</sub>)<sub>2</sub> = DEZ


<b>Recipe: AZO 20T</b>
<b>Recipe: AZO 20T</b>

Revision as of 23:12, 14 March 2017

THIS PAGE IS UNDER CONSTRUCTIONUnder construction.png

Et2Zn or Zn(CH3CH2)2 = DEZ

Recipe: AZO 20T

Maximum deposition thickness: xx nm

Temperature: x oC - xx oC

# macrocycles n
# cycles 20 1
Precursor DEZ DEZ H2O H2O TMA TMA H2O H2O
Nitrogen flow 200 sccm 200 sccm 150 sccm 150 sccm 200 sccm 200 sccm
Pulse time 0.1 s 0.1 s 0.1 s 0.1 s 0.1 s 0.1 s 0.1 s 0.1 s
Purge time 0.5 s 20.0 s 0.5 s 20.0 s 0.5 s 20.0 s 0.5 s 20.0 s


How to fill out the process log in LabManager:

The pulse time for each precursor equals the total pulse time times the number of cycles in each macroscycle.

DEZ pulse time: (0.1 + 0.1) s * 20 = 4 s

TMA pulse time: (0.1 + 0.1 )s * 1 = 0.2 s

H2O pulse time: [(0.1 + 0.1) s * 20] + [(0.1 + 0.1) s * 1] = 4.2 s

The number of cycles for each precursor now equals the number of macrocycles (n).


Recipe: AZO 25T

Maximum deposition thickness: xx nm

Temperature: x oC - xx oC

# macrocycles n
# cycles 25 1
Precursor DEZ DEZ H2O H2O TMA TMA H2O H2O
Nitrogen flow 200 sccm 200 sccm 150 sccm 150 sccm 200 sccm 200 sccm
Pulse time 0.1 s 0.1 s 0.1 s 0.1 s 0.1 s 0.1 s 0.1 s 0.1 s
Purge time 0.5 s 20.0 s 0.5 s 20.0 s 0.5 s 20.0 s 0.5 s 20.0 s


How to fill out the process log in LabManager:

The pulse time for each precursor equals the total pulse time times the number of cycles in each macroscycle.

DEZ pulse time: (0.1 + 0.1) s * 25 = 5 s

TMA pulse time: (0.1 + 0.1 )s * 1 = 0.2 s

H2O pulse time: [(0.1 + 0.1) s * 20] + [(0.1 + 0.1) s * 1] = 5.2 s

The number of cycles for each precursor now equals the number of macrocycles (n).


Recipe: AZO 30T

Maximum deposition thickness: xx nm

Temperature: x oC - xx oC

# macrocycles n
# cycles 30 1
Precursor DEZ DEZ H2O H2O TMA TMA H2O H2O
Nitrogen flow 200 sccm 200 sccm 150 sccm 150 sccm 200 sccm 200 sccm
Pulse time 0.1 s 0.1 s 0.1 s 0.1 s 0.1 s 0.1 s 0.1 s 0.1 s
Purge time 0.5 s 20.0 s 0.5 s 20.0 s 0.5 s 20.0 s 0.5 s 20.0 s


Recipe: AZO 35T

Maximum deposition thickness: xx nm

Temperature: x oC - xx oC

# macrocycles n
# cycles 35 1
Precursor DEZ DEZ H2O H2O TMA TMA H2O H2O
Nitrogen flow 200 sccm 200 sccm 150 sccm 150 sccm 200 sccm 200 sccm
Pulse time 0.1 s 0.1 s 0.1 s 0.1 s 0.1 s 0.1 s 0.1 s 0.1 s
Purge time 0.5 s 20.0 s 0.5 s 20.0 s 0.5 s 20.0 s 0.5 s 20.0 s
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