Specific Process Knowledge/Thin film deposition/ALD Picosun R200/AZO deposition using ALD: Difference between revisions
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{| border="2" cellspacing="2" cellpadding="9" align="none" | |||
|- | |||
| | |||
!EtZn<sub>2</sub>O | |||
!EtZn<sub>2</sub>O | |||
!H<sub>2</sub>O | |||
!H<sub>2</sub>O | |||
!TMA | |||
!TMA | |||
!H<sub>2</sub>O | |||
!H<sub>2</sub>O | |||
|- | |||
!Nitrogen flow | |||
| | |||
| | |||
|200 sccm | |||
|200 sccm | |||
|150 sccm | |||
|150 sccm | |||
|200 sccm | |||
|200 sccm | |||
|- | |||
!Pulse time | |||
|0.1 s | |||
|0.1 s | |||
|0.1 s | |||
|0.1 s | |||
|0.1 s | |||
|0.1 s | |||
|0.1 s | |||
|0.1 s | |||
|- | |||
!Purge time | |||
|0.5 s | |||
|20.0 s | |||
|0.5 s | |||
|20.0 s | |||
|0.5 s | |||
|20.0 s | |||
|0.5 s | |||
|20.0 s | |||
|- | |||
!# cycles | |||
|colspan="4" align="center"|20 | |||
|colspan="4" align="center"|1 | |||
|} |