Specific Process Knowledge/Etch/DRIE-Pegasus/Isotropic: Difference between revisions
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| Line 102: | Line 102: | ||
| 150 <!-- SF6 flow --> | | 150 <!-- SF6 flow --> | ||
| 0 <!-- O2 flow --> | | 0 <!-- O2 flow --> | ||
| 0 <!-- Ar flow --> | |||
| 600 <!-- coil power --> | | 600 <!-- coil power --> | ||
| 3 <!-- platen power --> | | 3 <!-- platen power --> | ||
| Line 107: | Line 108: | ||
| NA <!-- keywords --> | | NA <!-- keywords --> | ||
|- | |- | ||
! | ! - <!-- recipe name --> | ||
| <!-- step --> | | <!-- step --> | ||
| <!-- chiller temp --> | | <!-- chiller temp --> | ||
Revision as of 13:52, 3 June 2016
| Recipe | Step | Temp. | Deposition step | Etch step | Process observations | |||||||||||||
|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|
| Time | Pres. | C4F8 | SF6 | O2 | Coil | Time | Pres. | C4F8 | SF6 | O2 | Coil | Platen | HW | Runs | Key words | |||
| mediumiso1 | - | 20 | NA | NA | NA | NA | NA | NA | NA | 25 | 0 | 150 | 0 | 600 | 3 | - | 1 | NA |
| - | ||||||||||||||||||
| Recipe | Step | Temperature | Time | Pressure | C4F8 | SF6 | O2 | Ar | Coil | Platen | Runs | Key words |
|---|---|---|---|---|---|---|---|---|---|---|---|---|
| mediumiso1 | - | 20 | NA | 25 | 0 | 150 | 0 | 0 | 600 | 3 | 1 | NA |
| - |