Specific Process Knowledge/Etch/DRIE-Pegasus/Isotropic: Difference between revisions
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! width="50"| Coil | ! width="50"| Coil | ||
! width="50"| Platen | ! width="50"| Platen | ||
! | ! width="50"| Runs | ||
! width="100" | Key words | ! width="100" | Key words | ||
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Revision as of 13:51, 3 June 2016
| Recipe | Step | Temp. | Deposition step | Etch step | Process observations | |||||||||||||
|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|
| Time | Pres. | C4F8 | SF6 | O2 | Coil | Time | Pres. | C4F8 | SF6 | O2 | Coil | Platen | HW | Runs | Key words | |||
| mediumiso1 | - | 20 | NA | NA | NA | NA | NA | NA | NA | 25 | 0 | 150 | 0 | 600 | 3 | - | 1 | NA |
| - | ||||||||||||||||||
| Recipe | Step | Temperature | Time | Pressure | C4F8 | SF6 | O2 | Ar | Coil | Platen | Runs | Key words |
|---|---|---|---|---|---|---|---|---|---|---|---|---|
| mediumiso1 | - | 20 | NA | 25 | 0 | 150 | 0 | 600 | 3 | 1 | NA | |