Specific Process Knowledge/Etch/Etching of Silicon Oxide/SiO2 etch using AOE/Standard recipe with resist mask/Striation: Difference between revisions
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=Striation: Side wall roughness= | =Striation: Side wall roughness= | ||
==Sidewall roughness and resist surface after etch viewed with SEM== | |||
<gallery caption="Striation with different resists used" widths="300px" heights="250px" perrow="4"> | <gallery caption="Striation with different resists used" widths="300px" heights="250px" perrow="4"> | ||
Revision as of 12:41, 18 April 2016
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Striation: Side wall roughness
Sidewall roughness and resist surface after etch viewed with SEM
- Striation with different resists used
Roughness of the resist after etch measured with the AFM