Specific Process Knowledge/Etch/Etching of Silicon Oxide/SiO2 etch using AOE/Standard recipe with resist mask/Striation: Difference between revisions
< Specific Process Knowledge | Etch | Etching of Silicon Oxide | SiO2 etch using AOE | Standard recipe with resist mask
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|colspan="6" style="text-align: center;" style="background: #000000; color: white;" | '''AOE etch with | |colspan="6" style="text-align: center;" style="background: #000000; color: white;" | '''AOE etch with AZ5214E resist with different treatments''' | ||
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|No treatment before AOE etch | |No treatment before AOE etch | ||
|No treatment after 5min AOE etch | |No treatment after 5min AOE etch | ||
|Flood-E | |Flood-E 55s + 120s@110dg | ||
|Flood-E | |Flood-E 55s + 120s@110dg + 5min@150dg | ||
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Revision as of 10:39, 18 April 2016
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Striation: Side wall roughness
- Striation with different resists used
Roughness of the resist after etch measured with the AFM