Revision as of 10:44, 11 February 2016

Feedback to this page: click here

THIS PAGE IS UNDER CONSTRUCTION

Results	Test on wafer with 50% load (Travka 50), by BGHE @danchip
Etch rate of PECVD BPSG	39.4nm/min (22-01-2016)
Selectivity to resist [:1]	Not known
Wafer uniformity (100mm)	Not known
Profile [^o]	Not known
Wafer uniformity map (click on the image to view a larger image)	Not known
SEM profile images	NONE
Comment

@@ Line 2: / Line 2: @@
 =<span style="background:#FF2800">THIS PAGE IS UNDER CONSTRUCTION</span>[[image:Under_construction.png|200px]]=
+{| border="2" cellspacing="2" cellpadding="3"
+|-style="background:Gray; color:White"
+!Parameter
+!Resist mask
+|-
+|Coil Power [W]
+|800
+|-
+|Platen Power [W]
+|100
+|-
+|Platen temperature [<sup>o</sup>C]
+|0
+|-
+|CF<sub>4</sub> flow [sccm]
+|30
+|-
+|H<sub>2</sub> flow [sccm]
+|10
+|-
+|Pressure [mTorr]
+|4
+|-
+|}
+{| border="2" cellspacing="2" cellpadding="3"
+|-style="background:Black; color:White"
+!Results
+!Test on wafer with 50% load (Travka 50), by BGHE @danchip
+|-
+|Etch rate of PECVD BPSG
+|'''39.4nm/min (22-01-2016)'''
+|-
+|Selectivity to  resist [:1]
+|Not known
+|-
+|Wafer uniformity (100mm)
+|Not known
+|-
+|Profile [<sup>o</sup>]
+|Not known
+|-
+|Wafer uniformity map (click on the image to view a larger image)
+|Not known
+|-
+|SEM profile images
+|NONE
+|-
+|Comment
+|
+|-
+|}